Used NIKON NSR 2205 i11D #9247255 for sale

NIKON NSR 2205 i11D Wafer Stepper is an advanced piece of imaging equipment built for semiconductor optical lithography processes. It is designed for wafer alignment and precision exposure, which is used in the fabrication of high-end semiconductor devices. As a flagship product from NIKON, the stepper delivers superior performance and provides a comprehensive portfolio of advanced functions. It is capable of up to 5 generations of device geometries in the 0.14 μm range, offering superior resolution and accuracy in all lithography operations. The unit features a newly designed optical stage, offering high-speed and smooth operation. It is equipped with a "Line Scan Aperture," a unique device that enables accurate alignment of wafers with a high speed scanning mode of up to 30kHz. Additionally, the unit includes a proprietary "High-resolution Focus Image Monitor" which allows users to detect process conditions, enabling a greater degree of process accuracy. Furthermore, NIKON NSR-2205I11D stepper utilizes sophisticated pattern-matching algorithms, providing the ability to achieve perfect registration at the device level. This allows for improved accuracy with resolutions up to 1.4 nm. Furthermore, the system is designed for use with a variety of different exposures, including vertical and lateral alignments, double patterning and double exposure. Additional exceptional features of NSR 2205I11D include an advanced Scanning/Laser Mode, a Diffraction Error Calibration Mode, a Noise Reduction Mode and an Anti-Vibration Sub-zero Function. The Scanning/Laser Mode allows for precision alignment of overlapping patterns with a high-speed laser while the Diffraction Error Calibration Mode reduces diffraction-related patterns. Finally, both the Noise Reduction Mode and the Anti-Vibration Sub-zero Function are useful for preventing distortions and for stabilizing wafers. Overall, NIKON NSR 2205I11D Wafer Stepper is an innovative, state-of-the-art imaging equipment designed for advanced lithography processes. Its unparalleled feature set provides exceptional measurements and process control, with high resolution, accuracy and precision. It is ideal for high-end semiconductor device production processes and delivers impressive results every time.