Used NIKON NSR 2205 i11D #9251004 for sale
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ID: 9251004
Vintage: 1996
Stepper
MCSV Basic version: 2.31D
OCS Option: 2.18A
Main system: 2.42A
Reticle loader
Stage
Operation panel
Wafer loader
Lens controller
Alignment
Main computer:
System: VAX4000.90A
Hard disk: DKA200, DKA300
Illumination type: SHRINC3
Revolver type: Conv, ann, small
Wafer stage:
Chuck type, 8"
Screw type: Ball
Reticle alignment: VRA, ISS
Reticle microscope
Wafer alignment: LSA, FIA
Multiple auto focus
Wafer loader, 8"
Loader type: Type2 (A3)
OF Type: Notch
Flatzone: 6 O'Clock
Cassette: Left and right
Control rack position: Right side
Reticle loader, 6"
(13) Slots
Wafer flatness: 1.510 um
Wafer leveling:
X: -0.248 sec
Y: 0.049 sec
Reticle blind setting accuracy:
XP: 0.5 mm
Xm: 0.6 mm
Yp: 0.7 mm
Ym: 0.5 mm
Stepping:
3σ-X: 0.025 um
3σ-Y: 0.023 um
INC Adjustment:
Maximum-minimum: 0.311 um
Curvature: 0.010 um
UR-LL: -0.056 um
UL-LR: 0.081 um
DIS Adjustment:
Maximum-X: 0.037 um
Maximum-Y: 0.047 um
Minimum-X: -0.051 um
Minimum-Y: -0.044 um
Exposure power: 565 mw/cm²
Power uniformity: 0.934%
1996 vintage.
NIKON NSR 2205 i11D is a high-performance wafer stepper designed for advanced lithography lithography and inspection applications. It consists of two main components, a highly advanced illuminating equipment and an advanced moving stage. The illuminating system forms an optimized projection lens that projects a high-resolution pattern onto a semiconductor wafer, allowing for precisely formed features and greater uniformity. The lens is supported by a mercury-arc lamp, which provides a high degree of illumination over a large area. The optical components include a laser diode and a series of lenses that help provide uniform illumination. The illumination unit also features a projection lens crosshair for enhanced accuracy. The advanced moving stage is designed to smoothly move the wafer across the surface of the lens, providing a high degree of accuracy and repeatability. The stage can be programmed with a range of parameters, allowing it to make precise movements and achieve desired working distances while still providing the required exposure time. Advanced control systems are used to ensure that the wafer is precisely positioned. NIKON NSR-2205I11D is fitted with several safety and maintenance features that ensure its reliability and longevity. Its ergonomic design reduces operator fatigue, and its built-in maintenance reminder machine helps to reduce downtime. The wafer stepper also incorporates an environmental management tool, monitoring and recording temperature and humidity levels to protect components from damage. NIKON has designed NSR 2205I11D to provide high-quality, high-resolution images. Its advanced illumination asset and moving stage ensure accurate and uniform images, while its safety and maintenance features ensure reliable and lasting performance. NSR 2205 I 11 D is suitable for wafer lithography, inspection and metrology applications in semiconductor manufacturing facilities.
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