Used NIKON NSR 2205 i11D #9359229 for sale

Name: NIKON NSR 2205 i11D
Brand: NIKON
SKU: 9359229
Availability: InStock

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Wafer Steppers

Manufacturer

NIKON

Model

NSR 2205 i11D

ID: 9359229

Wafer Size: 2"-8"

Vintage: 1995

Stepper, 2"-8" Wafer stage: Chuck, 8" Chuck type: Ring type Screw type: Ball Reticle alignment: VRA, ISS Wafer alignment: LSA, FIA Multiple auto focus Chamber: ASAHI N2A Main computer: Hard Disk Drive (HDD): DKA200, DKA300 Storage drive: DAT Drive (MKA 500) Illumination type: Shrinc type: 3 Revolver type: Conv, Ann, Small Wafer loader, 8" Loader type: 2 (A3) OF Type: Flat In line type: Right Cassette: Left, right Reticle loader, 6" (13) Slots Lens data: Lens controller Lamp power (>650 mW / cm²): 619.047 Illumination uniformity (<2%): 0.75% Stepping accuracy (<0.050 µm): 0.020/0.022 DIS (Within ±0.050 µm): X (Min): 0.023um X (Max): 0.039um Y (Min): -0.036um Y (Max): 0.037um INC (<0.35 µm): 0.245 um (Max-Min) AST (<0.25 µm): 0.002 um UL-LR (Within ±0.2 µm): -0.001 um UR-LR (Within ±0.2 µm): -0.051 um 1995 vintage.

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NIKON NSR 2205 i11D is an advanced immersion stepper featuring a superior image quality, high productivity and improved process stability. With a field size of 5.0 x 5.0 mm it is designed for use in sub micron device fabrication applications. This stand-alone equipment integrates both stepper and immersion scanner technologies enabling optimal process control. The system is equipped with a high speed 4K immersion optics to achieve superior image quality. It utilizes world-leading laser pattern generator to optimize feature size and contrast. The unit is built with wafer-dedicated data processing architecture to enable fast pattern transfer and short scan times. It also has a dedicated image processing engine to enable high throughput inspection. NIKON NSR-2205I11D is designed to deliver high productivity and improved process stability. It has an integrated litho-etch-litho-etch (LELE) capability to enable simultaneous multiple photolithography layers. It is compatible with a wide range of optical elements including high numerical aperture immersion lenses, annular illumination lenses and off-axis illumination systems. The machine also features built-in exposure field stitching and exposure pattern stitching functions to enable fast wafer probing and quick exposure times. NSR 2205I11D is also equipped with a fast z-drive option which reduces exposure time even more significantly. It is fitted with a joystick and 6 axis motorized stage for precise alignment and exposure control. NSR-2205 I11D is a cost-effective and reliable high productivity wafer stepper for the sub micron device fabrication industry. It's advanced optics and imaging allow for superior image quality and process stability even for the most challenging fabrication processes. Furthermore, its high speed factory data processing and power exposure functions make it a highly reliable and cost-effective tool for any wafer fabrication.