Used NIKON NSR 2205 i12C #293752261 for sale

Name: NIKON NSR 2205 i12C
Brand: NIKON
SKU: 293752261
Availability: InStock

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Wafer Steppers

Manufacturer

NIKON

Model

NSR 2205 i12C

ID: 293752261

Wafer Size: 6"

Vintage: 1997

Stepper, 6" Resolution (NA=0.57): Within 0.45 µm DOF: 0.8 µm Lens Distortion (incl. magnification error): Within ±55 nm Lens Distortion Stability: Within ±20 nm Focus Stability: Within ±0.25 µm Open Frame (Max. Exposure Area): 22.0 mm × 22.0 mm (17.96–25.20) Auto Focus Calibration Repeatability: 3σ ≤ 100 nm Auto Focus Offset Range: Within ±20 µm Lamp Power: 700 mW/cm² Lamp Uniformity: Within 1.5 % Dose Control Accuracy (Integrated Exposure Stability): Within ±1.0 % Reticle Blind: +0.4 mm ~ +0.8 mm Reticle Alignment Accuracy: Absolute value within ±0.02 µm of target value, Repeatability within 0.015 µm LSA Overlay Accuracy: |X| + 3σ ≤ 0.065 µm FIA Overlay Accuracy: |X| + 3σ ≤ 0.065 µm Stepping Accuracy: ±0.04 µm (3σ) Orthogonality: Within ±0.1 sec Wafer Stage Flatness: Within 2.0 µm / 200 mm Chip Leveling: Within 4.8 µrad / 22 mm Wafer Prealignment Repeatability: 3σ within 15 µm Self Measurement Program (Option): Automatic Temperature: 23°C Chamber Type: S20 NA Variable System Reticle Size: 6" (Normal) Reticle Microscope: Fix Max Field Size: 22 mm PPD Reticle Barcode Reader Reticle Loader: Standard (13 Slot) Reticle Case: 6" Standard Pre Alignment Wafer Loader: Type2 Chip Leveling Wafer Carrier Table: Left, Right Alignment Sensor: LSA, FIA Rack Type: Normal (Right) Body‑OP Ruck Cable: 3 m (Normal) No Wafer Edge Exposure Lamp Power: 2 kW (Normal) Illumination: SHRINC3 1997 vintage.

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NIKON NSR 2205 i12C Wafer Stepper is a fully automated, high precision lithography equipment that is designed to produce photomasks and reticles. The system is equipped with a 12-inch variable slit camera (VSC) and a 12-inch field of view (FOV) which ensures superior imaging quality and outstanding throughput. Its Real-Time Defocus Control unit (RDC) ensures excellence in wafer imaging. It is powered by an intelligent i-series controller (i12C), which provides high-end performance and operational efficiency. It also provides instant access to functions and settings, and simplifies manual data entry. The software features, such as the intelligent slit selector (ISS), enhance operational efficiency and reliability. NIKON NSR-2205I12C is capable of pre-aligning and stepping at high speeds while delivering accurate exposure uniformity. It is programmed to deliver consistent exposure uniformity with Target Uniformity Control (TUC). The Wafer Stepper also offers excellent temperature stability and smooth operation in controlling effects of thermal drift. NSR 2205 i12C can expose wafers with up to 300 mm (12 inches) of exposure range, accommodating today's most demanding semiconductor processing needs. It can reach a resolution of half micron at 785 nm wave length, ensuring maximum fidelity and support for the most advanced 10nm process nodes. NSR-2205I12C's proprietary Six-Axis Motor Machine (SAM) provides optimized vertical scanning capabilities for both pattern overlay and exposure optimization. The Automatic Tool Maintenance (ASM) feature ensures that users get dependable field operation over the long-term. NIKON NSR 2205 i12C Wafer Stepper is designed for quick, efficient and reliable imaging workflow. Its high-end optics and sophisticated software platforms make it an ideal choice for demanding semiconductor imaging processes. Its sophisticated technology and advanced features offer users the highest possible wafer imaging quality and operational reliability.