Used NIKON NSR 2205 i12C #9379646 for sale
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ID: 9379646
i-Line stepper, 6"
Chamber temperature: 23°C
Chamber type: S16
NA Variable system
Reticle, 6"
Fixed reticle microscope
Maximum field: 22 mm
Reticle loader: Standard, 13-Slots
Reticle case: Standard, 6"
Pre alignment-2
Wafer loader: Type II
Chip leveling
Wafer carrier table: Left, right
Alignment sensor: LSA, FIA
Body-OP Ruck cable: 3 m
Rack type: Right
Lamp power: 2000 W
SHRINC Type 3 Illumination
Wafer holder flatness: ≤2.5 μm / 200 mm
Field inclination: Within 0.35 μm
Leveling setting accuracy: Within ±1.5 sec
Lens distortion: ≤±0.50 µm
Reticle blind setting accuracy: 0. 4mm - 0.8mm
Exposure power: ≥700 mW/cm²
Illumination uniformity: ≤±1.5%
Integrated exposure dose control: ≤±1.0%
Array orthogonality: Within ±0.1 sec
Reticle rotation: |M|+3σ ≤20 nm
Stepping accuracy: 3σ ≤45 nm
No wafer edge exposure
No signal tower
No PPD
No reticle barcode reader
No extend R-library
No In-line
Overlay:
LSA: |M|+3σ ≤75 nm
FIA: |M|+3σ ≤75 nm
Accuracy: ±55 nm
Wafer pre-alignment repeatability:
X, Y, θ: 3σ ≤ 15 μm
Y-θ: 3σ ≤ 20 μm
Resolution: 0.45 μm
Magnification: 5:1
Depth of focus: 2.00 μm
Exposure wavelength: 365 nm
1997 vintage.
NIKON NSR 2205 i12C is a wafer stepper providing sub-micron patterning accuracy and fast exposure times. It has a maximum exposure field size of 12 inches (305 mm) and a maximum wafer diameter of 8 inches (200 mm). Its optics have a numerical aperture (NA) of 0.63, enabling resolution up to 0.2 μm. The advanced UV light source, equipped with an iris shutter, offers user-selectable exposure energy with an accuracy of ± 0.5 % in 0.5 mJ increments up to 13 mJ/cm². NIKON NSR-2205I12C is designed to support a variety of different user requirements by allowing users to select from a range of process software drivers, including developed and verified conditions for all major resist materials. Process recipes needed for exposure can be managed using an intuitive graphical user interface. Additionally, easy-to-use inspection tools allow users to inspect and monitor both stitched and area exposures with off-axis integrated height, width, iso-or-resist measurements automated by the equipment (MAPS). Its wafer stage system offers highly accurate multi-field stitching and reduced stage vibrations during exposure. Furthermore, its simple design allows for easy consumables access, making maintenance and changing of components a breeze. This unit also features an automated wafer alignment machine for high throughput. Overall, NSR 2205 i12C wafer stepper is an advanced stepper that allows users to easily and quickly achieve sub-micron patterning accuracy. It offers a high-performance and intuitive way to manage process recipes, easy maintenance and an automated wafer alignment tool. Other features such as the advanced UV light source and the iris shutter enhancer make this asset suited for the most demanding lithography applications.
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