Used NIKON NSR 2205 i12D #293601857 for sale

Name: NIKON NSR 2205 i12D
Brand: NIKON
SKU: 293601857
Availability: InStock

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Wafer Steppers

Manufacturer

NIKON

Model

NSR 2205 i12D

ID: 293601857

i-Line stepper Resolution: 0.35 µm UDOF: ≥ 0.6 µm CD Uniformity: ≤ 50 nm Focus calibration repeatability: 3 Sigma ≤ 0.1 µm Lens distortion: Within ±50 nm Maximum area: 22 x 22 mm Reticle blind setting accuracy: 0.4 to 0.8 mm Exposure power: ≥ 600 mW / cm² Integrated exposure control: Within ±1% Illumination uniformity: Within 1% Reticle rotation: Within 20 nm Absolute value Repeatability Overlay accuracy: ISA-EGA: 3 Sigma ≤ 65 nm FIA-EGA: 3 Sigma ≤ 65 nm Array orthogonality: Within ±0.1 sec Stepping precision: 3 Sigma ≤ 50 µm Operational test: 99.5% Success rate Wafer system: 100% Success rate Reticle Wafer pre alignment: 3 Sigma ≤ 15 µm Focus stability: ≤ 0.6 µm Magnification error: Within 15 nm Stepping rate: 27 sec Throughput: ISA-EGA: 25 min 25 sec / less FIA-EGA: 30 min 25 sec / less INC: ±0.35 µm Astigmatism total focus deviation 0.35 µm L and S: ≤ 0.3 µm Field curvature: ≤ 0.3 µm Chip leveling accuracy: Within ±1.5 sec.

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NIKON NSR 2205 i12D stepping equipment is the latest in NIKON lineup of advanced high-resolution wafer steppers. Offering an unprecedented level of capability, the system combines a high resolution throughput with a fully integrated, high-precision stepper unit. This stepper, which has been designed for advanced lithography process needs, features an unrivaled 12 inch scan aspect ratio (SAR) that enables it to produce imaging patterns with a high level of accuracy and repeatability at up to 5 micron resolution. NIKON NSR-2205I12D stepping machine is able to provide superior imaging accuracy, repeatability and throughput speeds with the advanced NIKON proprietary lens technology package that incorporates high-precision lenses, advanced optics and advanced illumination designs. Its use of advanced composite materials provides a rugged, repeatable scanning and wafer-holding capability that is able to handle high-speed exposures of up to 15,000 exposures per hour in various scanning sizes. Additionally, NSR-2205I 12D has been designed with the user in mind, making it both an advanced and friendly tool to use. A simplified, user-friendly interface asset and an improved operator ergonomics improve user productivity and ease of use. NSR 2205 I12 D has also been designed with the needs of high-yield processes in mind. It features advanced imaging control systems and cutting-edge lithography process control technologies allowing for the efficient and cost-effective management of imaging processes. NSR-2205I12D also features an advanced wafer handling technology to ensure that wafers with rough surfaces, such as Si wafers, are properly handled, helping to maximize yield. It also comes with a suite of high-precision metrology systems, giving total control over the lithography process. Finally, NIKON NSR 2205 I12 D is equipped with various advanced functionalities, such as an auto alignment feature and the ability to process a wide range of substrates and materials, making it a great choice for top-end wafer-processing applications. All in all, NSR-2205 I12 D is a great choice for those looking to maximize their lithographic process throughput and accuracy. With its advanced features and capabilities, it is a reliable, accurate and rugged model that is sure to meet any of your high-end scanning needs.