Used NIKON NSR 2205 i12D #293606678 for sale
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NIKON NSR 2205 i12D wafer stepper is an advanced lithographic equipment designed for the highest levels of performance and reliability. The system utilizes proprietary i-Line and DUV illumination technologies to deliver mid-field resolution, high throughput, and extreme accuracy for advanced wafer fabrication. The stepper provides both high-field resolution and high-dynamic range imaging to ensure optimal lithography performance across the entire range of process steps. The design of the illumination unit uses both a IR laser and broadband illumination with a proprietary detector design to deliver uniform imaging across the entire range of exposure light flux. The patented design of the laser and the special optical approach minimize wavelength error and focus error of the DUV and i-Line imaging. The integrated design of the stepper allows for a fully automated wafer-stepping process. The CCD control architecture provides precise control of the wafer displacement through the i-Line four-quadrant projection machine to ensure high-throughput operation. The use of two controllers, an integrated EDB board, and built-in compensation software guarantee low-particle conditions and high tracking accuracy. The stepper is compatible with a variety of wafer materials and processing recipes, through a versatile design that offers various pattern-type capabilities. I-Line processing is made possible in the tool by the use of a high-efficiency lens design with aberration correction and an optimized light flux control asset to ensure edge-placement accuracy. Additionally, the model is capable of supporting high-density, full-field lithography processes and high alignment accuracy with an autofocus algorithm. NIKON NSR-2205I12D wafer stepper also includes a wide range of safety features, including anti-static technology, nitrogen injection, and interlocks for safe operation. The built-in predictive failure detection and end-stop equipment ensures protection of the stepper and its components from any potential damage. In conclusion, NSR-2205I 12D wafer stepper provides advanced lithographic performance, high-dynamic range imaging, and a versatile pattern-type compatibility. Its integrated design provides high-throughput, low-particle operation, and high-alignment accuracy. Furthermore, its safety features, including nitrogen injection and anti-static technology, provide additional protection for the system and its components.
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