Used NIKON NSR 2205 i12D #9225157 for sale

Manufacturer
NIKON
Model
NSR 2205 i12D
ID: 9225157
Wafer Size: 8"
Vintage: 1997
Stepper, 8" Electric source: Nema box, i-line Chamber type: ASAHI N2E-A Reticle size, 6" NIKON Reticle library: 10-Slot Fixed reticle microscope Maximum field size: 22 mm PPD Reticle bar code reader Reticle case, 6" Wafer size, 8" Semi Wafer type: Flat zone Wafer chuck, 8" Pre-alignment 2: 8" Wafer loader: Type2 (A3) Chip leveling No in-line Wafer carrier table: Left / Right, in-line Alignment sensor: LSA / FIA AGILENT / HP / HEWLETT-PACKARD / KEYSIGHT 5517C Laser LSA Laser: 5 mW NIKON OF Detection Rack type: Right Body-OP Rack cable: 3 m Lamp power: 2 kW SHRINC 3 VAX 4000/96 DAT Drive CRT Monitor Lens data NIKON Hard Disk Drive (HDD) 1997 vintage.
NIKON NSR 2205 i12D is a mid-to-high end wafer stepper that is used for pattern making and fabrication in the semiconductor industry. It is a powerful tool for lithography, with a 12-inch field size, 400mm wafer handling capability and 355nm of wavelength available for exposure. It features the high accuracy and resolution of i12 imaging performance, along with High Frame Rate (HFR) capabilities that exceed current industry standards. NIKON NSR-2205I12D also has an integrated Bruker light source, enabling scanning-field exposure with a high beam current of 30mA. NSR-2205I 12D is a true wafer level exposure system, designed to cope with the increasing number and complexity of devices being developed in the factory today. With 12 field sizes it offers reduced changeover times tuning and improved exposure uniformity. It also has a modular system architecture that allows for the addition or deletion of modules or components as the user's needs change. NSR-2205 I12 D has many other features that make it a powerful tool for everyday production applications. It offers high frame rates for high speed device exposure, as well as highly efficient energy saving options. NSR 2205 I 12 D also has an advanced light source module that features an integrated Brüker light source and an advanced exposure control module with a variable lamp current control and exposure modulation systems. NSR-2205 I12D comes with top-of-the-line control software and firmware, which allows the user to easily reprogram patterns and exposure parameters for each exposure. In addition to this, the user has the ability to choose between five exposure modes with different exposure or exposure modulation speeds. Additionally, it comes with a wide range of optics to be implemented, including patterns such as rayscan correcting lenses, line exposure optics and plate gates. For maintenance, NIKON NSR 2205 I 12 D also offers a remote system monitoring and operation, which allows the user to monitor statuses and failures remotely. This is especially useful in production environments, and helps to minimize downtime while increasing productivity. In conclusion, NSR 2205 I12 D is an ideal tool for lithography in the semiconductor industry. With its powerful imaging, high speed capabilities and modular design, it provides a powerful tool for efficient production patterns. Furthermore, its integrated Bruker light source and wide range of optics ensure that all exposures can be accomplished with precision, reliability and accuracy.
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