Used NIKON NSR 2205 i14E2 #293610268 for sale

NIKON NSR 2205 i14E2 is an advanced 193 nm immersion type micro lithography equipment designed for ultra-precision, high-throughput microfabrication. It offers a maximum resolution of 14 nm, an image field size of 450 mm by 450 mm, and an extended depth of focus. It has an advanced scanner and lens system that ensures the highest possible throughput and delivers excellent imaging results for both reticles and mask alignment, and simple, intuitive control. The unit is equipped with a new-generation i-line Coherent High Sensitivity Mode (CHSM) optics, which offers extremely high optical performance. It features patented wavefront adaptation, wavefront optimization and polarization functions, as well as an improved vertical alignment machine for high-accuracy overlay measurement with wafers in the vicinity. The tool also features an in-line vacuum post-exposure bake asset, which prolongs the lifetime of the reticles and ensures consistent, high-resolution imaging quality. In addition to its imaging capabilities, NIKON NSR-2205I14E2 is equipped with a variety of automation features, including full-field auto-alignment and built-in auto-calibration, much-improved printer patching strategies, and advanced edge placement adjustment. It also offers the ability to wafer image at up to 16 sites simultaneously. The model is designed to be a reliable and repeatable lithography equipment, making it ideal for high-yield microfabrication. Finally, NSR-2205 I14E2 is compatible with APC and ITOx software, which provides powerful lithography process control and management capabilities. With its fast scanning speeds, excellent imaging results, and wide range of automation features, NSR 2205I 14E2 is a powerful and versatile choice for precision wafer stepper applications.