Used NIKON NSR 2205 i14E2 #293794192 for sale

NIKON NSR 2205 i14E2 is a high-resolution photolithography stepper designed to produce semiconductor wafers of any given size. The equipment is equipped with a diffraction-limited optics system, a large scan range, and high levels of performance and stability. The unit is fully automated and offers a variety of advanced features including template editing, programmable micron increments for alignment, and a fast throughput time. The machine includes a DUV Microfield Exposure Series (MES) optics tool with a numerical aperture of 0.63 and a resolution of 0.71μm, providing the capability to create nanometer-scale structures on a semiconductor wafer. The optics asset is designed to maintain a uniform patterning across the entire field of view and provide excellent contrast transfer, with efficient aberration correction and diffraction-limited imaging quality. The model also includes a large scan range of 10 x 10mm to fully cover the needs of modern semiconductor manufacturers. The equipment's advanced vector scan technology provides stable step-and-repeat exposures and line stitch exposures without vibrations. Furthermore, the system offers high levels of repeatability for long-term patterning uniformity with a gap correction unit for micron alignment stability. The machine can be controlled in a number of ways, from a dedicated user interface or through its on-board programmable logic controller. It also includes a variety of safety features such as contactless protection and fast shutters, multiple safety locks, and automatic shutoff when over temperature is detected. NIKON NSR-2205I14E2 offers excellent throughput through its advanced features, including its APC tool that automates the loading, unloading, and exposure of wafers. Additionally, its PTI adjustment allows the user to correct parameter dispersions during scanning, while its template editing feature allows users to visualize their pattern prior to exposure. NSR-2205 I14E2 is an all-in-one stepper ideal for large-scale production of high-performing semiconductors. Its versatile and powerful tool set are designed for repeatability and accuracy, making it an excellent choice for manufacturers looking for a reliable and versatile photolithography asset.