Used NIKON NSR 2205 i14E2 #293817939 for sale

NIKON NSR 1125 i14E2 Wafer Stepper is a chromeless, anti-reflection coating (ARC) resistant, advanced wafer stepper suitable for VLSI, flat-panel display, and MEMS applications. It features a large pattern area of 6-inch diameter and supports high image overlay accuracy up to 15 nm. With a step and repeat rate of up to 1.2 million wafers per hour, a high pattern geometrical accuracy of 5 microns, and a field size of up to 70 x 70 mm, the NSR 1125 i14E2 offers excellent cost-efficiency and productivity for medium-volume production. Additionally, its submicron alignment systems also provide innovative solutions for many production requirements. NIKON NSR 1125 i14E2 Wafer Stepper includes a full-field aiming equipment which simplifies operations and improves accuracy of pattern alignment. It features extremely high-precision 0.1 mm registration accuracy and can detect extremely small particle defects based on image information. System functions such as Auto Pattern Matching, Auto Top Exposure Level, and Auto Zoom enhance process flexibility and improve productivity. This stepper is also equipped with a low-stress linear targeting method which minimizes lens deformation and pattern distortion, as well as a low-vibration stirring method that eliminates optical error by mixing liquid helium in the optical unit. NIKON NSR 1125 i14E2 Wafer Stepper is designed to withstand high-vacuum, high-temperature, and various types of gas exposure conditions, making it suitable for many types of production requirements including vacuum technology, marking, and drying. Moreover, the machine includes a dual-gantry stage design which sharply reduces wafer scrap rate and improves overlay accuracy. Its advanced wafer handling tool minimizes wafer movement while improving batch productivity. Furthermore, an environmental-control asset with forced-air cooling ensures the elimination of harmful particles. NIKON NSR 1125 i14E2 Wafer Stepper is controlled by NUMDBS, NIKON proprietary optical design software package. NUMDBS quickly calculates illumination and patterning settings and monitors alignment with digital Photomask (dPM) layer. This powerful software can also optimize layout data for improved process performance. This stepper's software incorporates a variety of safety features such as automatic beam blanking and dynamic exposure control for maximum safety. Moreover, a convenient mask changeover model also enables smooth process changeovers. In conclusion, NIKON NSR 1125 i14E2 Wafer Stepper offers an effective and cost-efficient wafer production solution that meets today's demanding semiconductor production requirements. Its features include a full-field aiming equipment, high image overlay accuracy, an environmental-control system, and advanced wafer handling unit, all designed to provide users with a reliable and accurate wafer production solution.