Used NIKON NSR 2205 i14E2 #9210465 for sale

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Manufacturer
NIKON
Model
NSR 2205 i14E2
ID: 9210465
Wafer Size: 8"
Vintage: 2001
Stepper, 8" Magnification: 1/5 Reduction Light source: i-Line (365nm) Resolution: 0.35um Variable Lens NA: 0.50~0.63 Variable Exposure filed size: 22mq (Up to 17.9H by 25.2V) Control: Bellows unit Lens adjust: Micrometer / PIEZO / Washer Lamp: 2.5kW Hg PC System hardware: Type: DMCC UPS: No Reticle size: 6" Reticle microscope: Fixed Alignment sensor: LSA FIA LIA: No TTLFC2 Illumination system: SHRINC4 Type Interferometer system: Interferometer type: 5517C Wafer stage Reticle stage Multi focus system Leveling system: Table Wafer loader: Type3 OF Type (2) Wafer cassettes Left in-line wafer (DNS) Wafer pre-align type: NC PRE2 Wafer edge exposure: No Reticle loader: Normal (3) Libraries / (30) Slots Barder reader Particle checker: (PPD3) Control rack: Type: Normal (Right) Cable length: Normal Signal tower: (4) Colors Chamber: ASHAHI N4A-C Double NEMA (CVCF) BATC / CATC / LLTC: 23.0 / 23.0 / 23.0 ° Missing parts: ALG A-504 PCB ALG A-505 PCB ALG A-506 PCB LLTC TEMP Sensor WL Robort arm WS X Linear AMP Piezo driver (A3, A4 PCB) Electrical power: 208V, 60Hz, 3 phase 2001 vintage.
NIKON NSR 2205 i14E2 is a leading-edge wafer stepper that is designed to provide highly accurate and reliable performance for high-volume device fabrication processes. The equipment offers unprecedented levels of resolution, superior performance, and versatile features for both lithography and repeated imaging applications. NIKON NSR-2205I14E2 offers a wide range of features to ensure optimal device fabrication performance. It is equipped with a powerful NSR-iF2 lithography system for advanced processes such as over-etching and dry etching. The unit is equipped with an advanced imaging engine that offers two-dimensional and three-dimensional alignment accuracy. It also features a range of advanced technologies such as a vertical shift mechanism and a high-precision laser auto-level machine to ensure accurate positioning of photomask and wafers. The tool is capable of producing devices with a precision of ± 1nm and offers a uniform image—even across large area devices. It is designed to be compatible with a variety of languages and substrates such as amorphous silicon, crystalline silicon, germanium, and gallium arsenide. The asset is capable of processing large-area devices up to a maximum size of 10,000 mm². It offers an extended depth of focus, allowing for deeper penetration into substrate layers, offering greater flexibility for process convergence. The model is also equipped with an auto-focus equipment, which quickly and easily adjusts the focus position to ensure superior image quality on each exposure. The system is designed with an intuitive user interface featuring dedicated menus for process settings, wafer information, and unit diagnostics. It offers full machine control with real-time monitoring and control of both the optical and substrate alignment systems. The user-friendly interface also allows the user to easily modify parameters, change exposure parameters, and store multiple recipes for maximum flexibility and efficiency. NSR-2205 I14E2 boasts an impressive industrial-grade design that offers superior reliability and accuracy in a variety of production environments. It has an integrated humidity and vibration protection tool, which reduces the effect of environmental changes on asset performance. The model also features low maintenance and easy calibration, with a high-precision instantaneous calibration equipment and self-diagnostic functions for trouble-free operation. NSR 2205I 14E2 is a high-performance, reliable, and accurate wafer stepper, delivering unparalleled performance in the most demanding device fabrication processes.
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