Used NIKON NSR 2205 i14E2 #9210465 for sale
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ID: 9210465
Wafer Size: 8"
Vintage: 2001
Stepper, 8"
Magnification: 1/5 Reduction
Light source: i-Line (365nm)
Resolution: 0.35um
Variable Lens NA: 0.50~0.63 Variable
Exposure filed size: 22mq (Up to 17.9H by 25.2V)
Control: Bellows unit
Lens adjust: Micrometer / PIEZO / Washer
Lamp: 2.5kW Hg
PC System hardware:
Type: DMCC
UPS: No
Reticle size: 6"
Reticle microscope: Fixed
Alignment sensor:
LSA
FIA
LIA: No
TTLFC2
Illumination system: SHRINC4 Type
Interferometer system:
Interferometer type: 5517C
Wafer stage
Reticle stage
Multi focus system
Leveling system: Table
Wafer loader: Type3
OF Type
(2) Wafer cassettes
Left in-line wafer (DNS)
Wafer pre-align type: NC PRE2
Wafer edge exposure: No
Reticle loader: Normal
(3) Libraries / (30) Slots
Barder reader
Particle checker: (PPD3)
Control rack:
Type: Normal (Right)
Cable length: Normal
Signal tower: (4) Colors
Chamber:
ASHAHI N4A-C Double NEMA (CVCF)
BATC / CATC / LLTC: 23.0 / 23.0 / 23.0 °
Missing parts:
ALG A-504 PCB
ALG A-505 PCB
ALG A-506 PCB
LLTC TEMP Sensor
WL Robort arm
WS X Linear AMP
Piezo driver (A3, A4 PCB)
Electrical power: 208V, 60Hz, 3 phase
2001 vintage.
NIKON NSR 2205 i14E2 is a leading-edge wafer stepper that is designed to provide highly accurate and reliable performance for high-volume device fabrication processes. The equipment offers unprecedented levels of resolution, superior performance, and versatile features for both lithography and repeated imaging applications. NIKON NSR-2205I14E2 offers a wide range of features to ensure optimal device fabrication performance. It is equipped with a powerful NSR-iF2 lithography system for advanced processes such as over-etching and dry etching. The unit is equipped with an advanced imaging engine that offers two-dimensional and three-dimensional alignment accuracy. It also features a range of advanced technologies such as a vertical shift mechanism and a high-precision laser auto-level machine to ensure accurate positioning of photomask and wafers. The tool is capable of producing devices with a precision of ± 1nm and offers a uniform image—even across large area devices. It is designed to be compatible with a variety of languages and substrates such as amorphous silicon, crystalline silicon, germanium, and gallium arsenide. The asset is capable of processing large-area devices up to a maximum size of 10,000 mm². It offers an extended depth of focus, allowing for deeper penetration into substrate layers, offering greater flexibility for process convergence. The model is also equipped with an auto-focus equipment, which quickly and easily adjusts the focus position to ensure superior image quality on each exposure. The system is designed with an intuitive user interface featuring dedicated menus for process settings, wafer information, and unit diagnostics. It offers full machine control with real-time monitoring and control of both the optical and substrate alignment systems. The user-friendly interface also allows the user to easily modify parameters, change exposure parameters, and store multiple recipes for maximum flexibility and efficiency. NSR-2205 I14E2 boasts an impressive industrial-grade design that offers superior reliability and accuracy in a variety of production environments. It has an integrated humidity and vibration protection tool, which reduces the effect of environmental changes on asset performance. The model also features low maintenance and easy calibration, with a high-precision instantaneous calibration equipment and self-diagnostic functions for trouble-free operation. NSR 2205I 14E2 is a high-performance, reliable, and accurate wafer stepper, delivering unparalleled performance in the most demanding device fabrication processes.
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