Used NIKON NSR 2205 i14E2 #9217458 for sale

NIKON NSR 2205 i14E2 is a state-of-the-art wafer stepper, designed and manufactured by NIKON, a recognized leader in imaging products. This stepper is a highly efficient and reliable tool for lithographic processes, which enables chip manufacturers to produce devices with production-level accuracy. Wafer steppers produce features on wafers by patterning light from a light source such as a laser or mirror onto the wafer. This is typically used in semiconductor manufacturing or research and development. NIKON NSR-2205I14E2 wafer stepper is a sophisticated choice for precise and accurate alignment of patterns onto wafers due to its robust performance and flexibility. It offers a 13.5-nanometer depth of focus and a 13.8 Nanometer full-field depth of focus, enabling high exposure precision and uniformity across the wafer. It features a 4" wide projection lens, providing wide exposure coverage, even at large-scale wafer patterns. Additionally, it supports various optics for different application and exposure requirements. NSR-2205 I14E2 wafer stepper offers a series of advanced options and functions, such as a high-precision alignment equipment, in-line wafer mapping system, constant speed and multiple exposures, automatic alignment adjustments, and more. For high-level integration and automation, it can be fully automated with NIKON Lasers and Etchers series accessories. This ensures that each wafer can be precisely exposed in the production environment. Furthermore, this wafer stepper is equipped with an intuitive user interface, ensuring easy and precise control of the wafer exposure unit. It has various built-in functions to improve the accuracy and efficiency of the process. The exposure time and illumination can also be controlled with software, allowing the user to control the exposure process precisely. In conclusion, NIKON NSR-2205 I14E2 wafer stepper is a precision solution for chip manufacturers. It delivers outstanding performance in imaging and alignment accuracy due to its accurate alignment machine, high exposure precision, and numerous automate functions. It is an ideal choice for any production environment where high-level accuracy and speed are required.