Used NIKON NSR 2205 i8 #9248501 for sale

Manufacturer
NIKON
Model
NSR 2205 i8
ID: 9248501
Steppers.
NIKON NSR 2205 i8 Wafer Stepper is a multi-function lithography equipment designed specifically for 8-inch wafers. The system is fully automated and can be used for a wide variety of optical lithography applications. It features a state-of-the-art 2 × zoom lens, dual 6-position optical settings, and a newly developed i-line source. NSR 2205 i8 Wafer Stepper is capable of accurately reproducing patterns on silicon wafers as small as 5 micrometers at a 0.5-micrometer resolution. It features an advanced alignment accuracy and reduced annealing time which are essential to minimize cycle times and reduce wafer yield. It is equipped with a mask alignment unit and an onboard actuator that can accurately place the mask in the center of the wafer during lithography. NIKON NSR 2205 i8 is equipped with a scan head and a fully integrated software that will enable users to control the lithography accurately and maintain repeatable performance. The machine uses a two-flash exposure process which can image both microscopic and mezzo features in a single exposure. It also offers compatibility with popular lithography design systems like Tape-to-Tape, CoreComplete and Maestro. NSR 2205 i8 has two different scan modes: linear and offline. The linear mode renders the image directly onto the wafer while the offline mode will render the image onto an intermediate substrate which can then be transferred onto the wafer. It also features two different optical settings of 6X and 12X for higher resolution imaging. The tool offers advanced metrology capabilities including built in review station, spectral scanning, and autofocus. In addition, it can be equipped with optional features such as an alignment verification asset, automatic wafer mapping, and alignment checkclamp. Overall, NIKON NSR 2205 i8 Wafer Stepper is an intelligent multi-function lithography model designed specifically for 8-inch wafers. It offers superior results in terms of pattern accuracy and throughput, making it the ideal choice for high-end lithography applications.
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