Used NIKON NSR 4425i #9044476 for sale
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NIKON NSR 4425i is a next-generation: i-line stepper used in lithography. It is part of NIKON NSR series of systems and is specifically designed to produce things such as integrated circuits, display devices, optical components and photomasks. NIKON NSR-4425I is a wafer stepper, which uses an electron beam to pattern wafers with nanometer resolution. NSR 4425 I features a number of technologies for superior wafer step performance. It is equipped with a high power lens actuator and beam stage that enable precise control of the focal point. This helps ensure precise pattern placement with nanometer precision accuracy while minimizing pulsing effects. Additionally, NIKON NSR 4425 I offers highly precise alignment accuracy through the integrated alignment equipment. The stepper also features advanced process control technology. The system employs a specialized detector unit to measure and evaluate every single step during patterning. This helps to prevent any errors in pattern clarity, ensuring that all wafers are processed in the most precise way possible. For improved throughput, NSR 4425i offers a high-performance control shutter. This feature provides the option to exposue selectively chosen areas in a single shot, significantly reducing exposure time and risks of errors. Furthermore, its highly sensitive multi-beam alignment machine can reduce the non-patterning area on the reticle and make it much easier to mark both precision and large patterns on the substrate. Moreover, the tool is designed for extraordinary flexibility. Its high-performance motor and advanced optics are suited for both high-end and low-end lithography processes. In addition, its ultra-precise beam rotator supports fine focus adjustment and allows it to handle a variety of substrates, from small chips to larger wafers. In closing, NSR-4425I is a wafer stepper that is capable of producing high-precision, high-resolution wafers with a higher level of accuracy and throughput than its predecessors. With its advanced optics, motion control and process control capabilities, it can achieve high-quality lithography results with greater productivity and improved yield.
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