Used NIKON NSR 4425i #9192105 for sale

NIKON NSR 4425i Wafer Stepper is a highly advanced piece of industrial equipment used for manufacture of semiconductors, microelectromechanical systems (MEMS), integrated circuits and other similar products. It is an optical lithography equipment which uses precise optics, precision motion control and sophisticated image-processing to rapidly produce intricate patterns on the surface of the substrate or wafer. The system is capable of generating line widths and spacings as small as 0.2 and 0.15 microns respectively, and it is capable of producing patterns with extremely high fidelity. It is also capable of producing through-holes with a diameter between 0.5 and 0.3 microns, and it can generate extremely precise three-dimensional grooves and shadows with a minimum layer thickness between 0.1 and 0.5 microns. The unit features an advanced F2 wavelength laser which provides outputs of up to 20W of power, allowing dynamic multi-exposure techniques which reduce the impact of variable substrate thickness and surface flatness. It also features a high precision pattern alignment machine which ensures that patterns are accurately aligned with each other and across multiple substrate levels. The tool includes an ergonomic mainframe which includes a laser scanner, stage and drive unit, digital controller, and a COLLECT Vision guidance asset. The model also includes a software environment which provides access to a range of features such as pattern viewing, alignment, print objectives and Vision ToolBox software, and the COLLECT Optics Manager equipment. NIKON NSR-4425I Wafer Stepper also features a variety of safety features to protect operators, including emergency stops, shielding and protective covers. It is also equipped with a Class 1 laser safety system which enables safe operation in even the most hazardous working environments. In summary, NSR 4425 I Wafer Stepper is an incredibly advanced, reliable and powerful industrial unit which provides the precision and accuracy required for the manufacture of high-quality wafers and semiconductors. It is an incredibly capable machine which utilizes powerful optics, motion control and image-processing to produce detailed and highly precise patterns with miniscule tolerances, and is capable of meeting the most exacting requirements of the advanced semiconductor industry.