Used NIKON NSR 4425i #9225991 for sale

NIKON NSR 4425i is a next-generation wafer stepper designed to support compelling lithography applications in nanotechnology and semiconductor manufacturing. The precise and precise alignment of mask to wafer has enabled complex, three-dimensional pattern transfer and higher reliability in photomasks used for semiconductor device fabrication. It is a state-of-the-art, 4-beam equipment ideal for 0.15 micron generation to 5xnm processes. With NIKON NSR-4425I, manufacturers can improve the yield of their process and enhance the accuracy of the printable features on the substrates. NSR 4425 I is a projection aligner with exceptional speed and accuracy, allowing it to deliver up to 200 steps per second with a resolution below 10nm. It offers a projection area capable of wafer size up to 200mm, a maximum shot size of 27mm, and a shot-to-shot overlay accuracy of 1.5nm Liner Error. The stepper also features high-precision linear stages, a vibration-shielded work-arm, and a CMOS-based autofocus system. Furthermore, NSR-4425I can be equipped with a high-speed fine alignment unit for high-accuracy performance. The projector of NSR 4425i uses a quadrilobe illumination machine with 100 times better consistency. It is also equipped with a high-intensity light source that produces an exceptionally large scan field, enabling it to print large substrates faster and more accurately. Additionally, NIKON NSR 4425 I is able to accurately decompose the mask pattern for printing in an orthogonal or curved field. NIKON NSR 4425i is user-friendly, featuring auto-start and auto-stop operations, repeated focus tracking, and a built-in lithography library with standard tools and settings. The built-in settings equalize the illumination and production conditions, allowing the operator to adjust the parameters according to the process requirements. Furthermore, NIKON NSR-4425I features an advanced metrology and defect measuring tool. This asset allows theuser to accurately monitor and measure the alignment, expose shape and dose, focus and edge placement, and contamination at each shot location and then report any potential defects. NSR 4425 I has a wide variety of programmable options and can easily be integrated into a production line. It comes with integrated network capabilities, facilitating remote monitoring and control of the model from a variety of workstations. The machine is also able to be linked to external testing and metrology systems, allowing users to collect detailed product data for further analysis and process control. Overall, NSR-4425I is an advanced wafer stepper that enables manufacturers to produce high-accuracy, high-precision patterns with exceptional speed, stability and accuracy. It is a reliable and user-friendly machine suitable for a wide range of lithography applications.