Used NIKON NSR-504 #9269128 for sale

NIKON NSR-504 is a wafer stepper that is designed specifically for photomask production, providing precise and reliable lithography exposure for 10x reticules and high volume production and flexibility for a variety of exposure applications. It is technically superior to other wafer steppers due to its patented "Pulsed Field Exposure Equipment" and fast laser exposure system. NSR-504 can process up to two full-field reticles in one cassette at the same time. This, combined with its fast data transfer, makes NIKON NSR-504 an ideal solution for high-volume production. NSR-504 also incorporates the latest in laser technology, including a high-density array of quartz lenses and beam splitters. NIKON NSR-504 comes equipped with a built-in exposure monitoring unit. Its unique design helps to reduce flare and eliminate stray light during exposure. A sophisticated algorithm is used to analyze the exposure dose to ensure accurate results. NSR-504 is user-friendly and intuitive. The software is designed to enable easy image alignment and smooth operation. For added convenience, NIKON provides integration and automation software to ensure seamless communication between various systems, including alignment and wafer transfer systems. NIKON NSR-504 is designed to perform a range of photomask applications, including optical fault detection, MEMS and FPCB masks, and more. It is capable of processing wafers up to 8 inches (200mm), with up to 200nm exposure accuracy. For superior results, NSR-504 is also equipped with a motorized stage and an autofocus machine for precise alignment. In addition, NIKON NSR-504 can use a range of resists. Thanks to its automatic resist selection feature, users can quickly select the most suitable resist for their application. The tool is also designed to minimize residue and prevent lithography related defects. Overall, NSR-504 is an extremely reliable and user-friendly wafer stepper that is ideally suited for photomask production. It features fast wafer transfer, advanced exposure control, and automated resist selection, making it an ideal choice for advanced of 10x reticules, as well as applications requiring high precision and accuracy.