Used NIKON NSR i11D #293610278 for sale

NIKON NSR i11D is a wafer stepper designed to accurately pattern photomasks used in semiconductor fabrication. It features a 20 nanometer alignment accuracy and provides a high exposure dose of 10 mJ/cm2. The i11D is equipped with NIKON advanced Scanning Station Module that enables focus and exposure optimization, auto-loading and unloading capabilities, auto alignment and target position detection sensing. The machine operates a 6-inch NA 0.63 beam with a wavelength of KrF excimer laser illumination. The i11D is comprised of a scanner, an objective lens, and a light source. The scanner is responsible for accurately positioning a pattern image on the photomask's wafer stage. The objective lens through which the exposure beam is focused is a specially designed aspherical lens with a diffraction efficiency that delivers excellent image fidelity. The light source is a KrF excimer laser capable of generating a high dose of exposure energy of 10 mJ/cm2, allowing the exposure of photoresist-coated masks to create patterns in the wafer. NSR i11D features an advanced Auto-Alignment equipment capable of recognizing and measuring fine alignment features on the photomasks. The system uses a projection camera to decipher alignment marks on the mask and determine the coordinates of the pattern to be exposed. Additionally, the Auto-Alignment unit is capable of patterning various feature sizes from 10 microns to 0.5 microns. NIKON NSR i11D is compatible with a range of photomask substrates, and can accommodate wafers larger than 100 mm diameter. The machine also comes with several built-in recipes for exposure settings tailored for specific photomask types. This makes it easier to maintain the same configurations when transferring jobs from one substrate to another. Finally, NSR i11D is equipped with a Real Time Defect Detection machine that inspects the exposed photomasks and detects any defects in near real-time. This ensures that the photomasks are accurately and reliably processed, while minimizing downtime and improving productivity.