Used NIKON NSR S203 #9315286 for sale

NIKON NSR S203 is a high-performance wafer stepper, designed for use in high precision lithography applications. The device is equipped with a 4-axis, 6-axis, or 7-axis equipment of stage motion, enabling a very high resolution of 0.5nm. The system is designed so that it can be adjusted to different wafer sizes, as well as the varying dimensions of the substrates. The original NSR S203 is a dual beam lithography unit which includes a long life lamp capable of providing a diffraction-limited illumination for a wide range of wavelengths. NIKON NSR S203 employs a number of proprietary technologies to achieve high throughput scanning and sub-micrometer accuracy. These include the Self-Triggering Frame Inserter (STFI) machine, Scan Control AutoTune (SCAT) tool, and the air bearing stage motion control asset. The STFI model ensures highest performance throughput with its 8-inch-diameter reticle and ensures high accuracy throughout the reticle exchange. The SCAT equipment ensures accurate scanning by adjusting the scan parameters on the fly, whereas the air bearing stage motion control system enables a step and repeat scanning mode with a high-speed controller. NSR S203 is also equipped with a full set of Print Alignment and Metrology solutions. The device is integrated with an alignment camera and a low-power Vision Inspection Unit (VIS), which provide correlation-free pattern alignment and assist in the monitoring of printed patterns. The VIS assists in the detection of overlay errors, line width and shape measurement, as well as 2D and 3D surface roughness measurements. A variety of calibration algorithms are used to improve process precision and reduce overlay errors. NIKON NSR S203 also features an advanced lithography optimization algorithm, which improves the overall stepper performance and accuracy. The optimization algorithm uses advanced software to automatically determine the optimal exposure parameters for the process, which results in improved device yield and fine patterning performance. The machine also provides a variety of patterning tools and helps minimize wasted wafers and lithography defects. To sum it up, NSR S203 is a high-performance wafer stepper designed for high precision lithography applications. It is equipped with a variety of proprietary technologies to achieve high throughput scanning and sub-micrometer accuracy. The device is further integrated with a host of Print Alignment and Metrology solutions, as well as a lithography optimization algorithm, to maximize performance and accuracy.