Used NIKON NSR S204 #293593219 for sale

NIKON NSR S204 is an advanced semiconductor lithography equipment designed for the reliable production of high-resolution microchips. The system is based on i-line lithography projection optics and utilizes NIKON advanced NSR exposure technologies to achieve unparalleled accuracy and repeatability in the wafer fabrication process. With a repeat accuracy of 0.05µm and a minimum exposure head-to-head distance of 0.05µm + 0.2µm, NSR S204 is an ideal tool for high-resolution applications. NIKON NSR S204 offers a complete set of exposure features, providing users with a broad range of exposure modes and controllable parameters. The unit includes a suite of advanced software tools and hardware components to enable the highest possible resolution, accuracy and speed. The machine also allows for complete control over the exposure process, enabling users to make fine adjustments to exposure settings while still producing high-quality results. NSR S204 is equipped with a high sensitivity linear field of view (LFOV) area scan type CCD image sensor and a two-dimensional scroll mode (TDSM) Stage. This combination results in fast, repeatable scans with exceptional repeat accuracy. The combination of the two elements provides for a fully automated process with little operator intervention required. The tool features a wavelength range of 365nm-440nm with excellent wavelength accuracy. The asset delivers a quick setting time and reduces downtime through the use of a curved field model. NIKON NSR S204's capabilities make it suitable for a wide range of applications from low to complex process lithography. NSR S204 incorporates a series of automated features like wafer alignment, wafer loading and unloading, and auto-focus of the lenses. It also comes with a comprehensive monitoring equipment to provide real-time feedback and performance reporting. A comprehensive safety and interlock system is included to minimize the potential for contamination. NIKON NSR S204 is the perfect tool for a reliable and consistent high-resolution wafer fabrication process. With its host of advanced features, it is an invaluable asset to any semiconductor fabrication process.