Used NIKON NSR S204 #9241845 for sale

NIKON NSR S204 is a wafer stepper designed for production and research in microelectronic and semiconductor industries. It is a specialized step and repeat tool optimized for precision patterning of microelectronic microstructures and circuit boards. NSR S204 utilizes a two-dimensional pattern generator to create the required pattern on the substrate. It uses a combination of beam optics, electron beam lithography, and optical imaging lenses. The electron beam is produced by a high-current gun and is shaped and steered towards the target surface using a series of focusing elements. This creates nanoscale features with feature sizes down to 17nm. The patterns created can be used to create microstructures for integrated chip designs. NIKON NSR S204 has a high standard of wafer pattern uniformity and registration precision. It has a patented twin track scanning system that provides high uniformity across all wafer sizes. It also has a unique twin track scanning field order with stepped accumulation to ensure accuracy when dealing with larger wafers. The step and repeat mode of NSR S204 allow a fine adjustment of the field size to maximize throughput within manufacturing processes. This wafer stepper has a wide range of process parameters, including a range of wafer sizes, exposures, and feature sizes. It is also capable of handling high- and low-temperature processes. It has a throughput of up to 3 wafers/hour, and an accuracy of 5-7nm. It is operational from -7°C to +50°C and has a supply voltage of 110V/20A, 50-60Hz. The mirror system is equipped with 5-axis capability to minimize vibration interference with the electron beam. NIKON NSR S204 is used for wafer-level patterning, achieving superior pattern quality and uniformity. Due to its precision patterning capabilities, it is ideal for advanced lithography and optoelectronic device processes. The wafer stepper offers a cost-effective way of accurately producing microstructures with minimum yield losses.