Used NIKON NSR S204B #293595741 for sale

NIKON NSR S204B is a world-class wafer stepper designed to maximize the speed and precision of lithography and exposure operations. This stepper combines advanced exposure technology and integrated metrology technology to enable rapid photomask fabrication with enhanced accuracy and minimal waste. This product provides a reliable, user-friendly system for manufacturing semiconductor-related products. NIKON NSR-S204B stepper has an advanced three-axis optical element design that allows for superior speed and accuracy in imaging. The FESEMIS (Fabrication Equipment Subsystem for Equipment Interface Standard) provides a flexible interface for integrating with a variety of equipment including inspection systems and material-moving devices. The FESEMIS supports a wide range of imaging formats, enabling stepper operation for both 8- and 12-inch diameter wafers. The stepper has four main integrated optical elements: an object lens, a field lens, an illumination lens, and a collection lens. The object lens covers a wide numerical aperture (N.A.), extending from 0.35 to 0.5, and has low distortion as well as true focus tilt and displacement corrections. The field lens provides a flat field, while the illumination and collection lenses are configured using advanced point-diffraction interferometry (PDI) technology. This combination of features ensures high-precision imaging with low distortion and low field curvature. NSR S 204 B stepper also features a comprehensive suite of functions that enable precise and precise mask process control. These include high-resolution registration (HRS) and optics power control (OPC) features that optimize exposure quality and throughput. The HRS feature allows precise and accurate alignment of the device field with the layout pattern, while the OPC feature enables global and local changes to be monitored and optimized on the stepper. This ensures precise imaging for high-resolution masks and ensures superior accuracy for fine line resolution masks. Furthermore, the stepper offers multiple functions for assisting with maintenance and operations control, including reporting, logging, and workload control. Overall, NSR-S 204 B stepper is an advanced, state-of-the-art wafer stepper solution. This product exhibits superior speed, accuracy and stability, making it an ideal choice for high-precision and high-throughput photomask fabrication processes. The combination of integrated optics and metrology technology, combined with the product's comprehensive suite of features and capabilities, makes NSR S204B the ideal stepper for semiconductor manufacturers.