Used NIKON NSR S204B #293606713 for sale

Manufacturer
NIKON
Model
NSR S204B
ID: 293606713
DUV Scanner Resolution: 0.18 NA: 0.68 Exposure wave length: KrF excimer Reduction: 1/4 Expose field: 25 x 33.
NIKON NSR S204B wafer stepper is an advanced piece of equipment designed to handle the complex process of lithographic etching of photomasks and wafers. This stepper is capable of producing high-precision structures of a wide variety of sizes and shapes using a variety of materials. NIKON NSR-S204B is able to achieve high resolution by utilizing various lenses that are specifically designed for different projects. This equipment offers a wide range of lens ranges from 5x to 60x, along with numerous linear and circle correction functions. The stepper can also rotate and lock the plate during exposure, as well as compensate for acceleration, further improving the accuracy and precision of the etching. Besides its optics and motion control system, NSR S 204 B also has a high-performance alignment unit. This advanced alignment machine utilizes 3 laser beams to ensure that the stepper is accurately adjusted, allowing the stepper to process wafers with a minimum of misalignment. NSR S204B also features a stream alignment process which can quickly identify, announce and adjust any misalignment in the wafer positioning. NSR-S204B also offers a built-in defect inspection tool that uses high-resolution cameras. This asset can detect and identify any defects on the surface or in the depths of the wafer, which needs to be treated or removed. The cameras can also be adjusted to various light intensities allowing the stepper to scan wafers of varying thicknesses and densities. In addition to its advanced optics and motion control systems, NIKON NSR-S 204 B also offers several safety and environmental systems to ensure optimal working conditions for the operators. This stepper utilizes a vacuum chamber and vacuum sensing systems that constantly monitor and adjust the air pressure in the chamber to prevent any contamination from dust and other particles. It also uses a multi-zone air filter technology to ensure that the air within the chamber is clean and free from pollen, dust and other particles. Overall, NIKON NSR S 204 B wafer stepper is a highly advanced piece of equipment capable of producing accurate and precise structures for any project. Its combination of advanced optics, motion control, alignment model and built-in defect inspection systems enables producers to produce high-quality products that meet their industry requirements. The safety and environmental systems further ensure that operators are operating in an optimal and safe environment, making NSR-S 204 B an ideal solution for wafer etching applications.
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