Used NIKON NSR S204B #293606906 for sale

NIKON NSR S204B Wafer Stepper is a state-of-the-art semiconductor lithography equipment designed for micron-scale patterning of semiconductor devices. The system utilizes a single lens unit with a 4X reduction optical machine to provide exceedingly precise alignment and patterning of devices. NIKON NSR-S204B Wafer Stepper tool is fully automated with advanced software that allows automatic adjustment of exposure parameters, alignment, and alignment accuracy. NSR S 204 B asset consists of a base unit, an integrated stepper control unit, a light source, and a motorized stage with X, Y, and Z translation. The base unit houses the optical microscope, stepper control unit, motor, motor drivers, and power supplies. The integrated stepper control unit communicates with the motor drivers over the EtherCAT protocol to control the vertical and horizontal movements of the stage. The motorized stage is powered by two DC stepper motors and includes a vertical linear servo motor for precise Z axis control. The controllable range of the stage is 100mm x 100mm in the X and Y directions, and 5mm in the Z direction. The light source employed in NSR S204B is a helium-cadmium laser. This laser emits light in the ultraviolet region of the spectrum, providing resolution to the sub-micron level. The laser's maximum power output is 15mW in the UV region and its wavelength is 355 nm. The model allows the user to control the focusing of the laser's beam by adjusting the relative position of the objective lens. The focusing range of the equipment is adherent to diffraction limits, allowing precise patterning of features at the sub-micron level. The main feature of NIKON NSR-S 204 B is its wafer handling capabilities. The system is equipped with a wafer spin chuck and allows direct handling of 6-inch wafers. The unit also includes wafer chucks and clamps that allows precise alignment of the wafer relative to the light beam, further enhancing overall alignment accuracy. In addition to its precise patterning capabilities and excellent wafer handling, NSR-S204B provides excellent reliability and availability. The machine is designed to run long production cycles and with minimal down time. The tool can be operated in an automated or manual mode and also includes a vacuum asset for wafer ejection and misaligned wafer handling. The integrated software of the model allows easy data handling, programming and parameter adjustment. The equipment also includes a network adapter port and a Visual Basic Scripting language, which allows programming of the system and through which user scripts can be created. In conclusion, NIKON NSR S 204 B provides an excellent combination of precisely patterning capabilities, automated wafer handling functions, and reliability. This unit makes an ideal tool to be used in semiconductor device production and research.