Used NIKON NSR S204B #293628991 for sale

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Manufacturer
NIKON
Model
NSR S204B
ID: 293628991
Wafer Size: 8"
Vintage: 2000
DUV Scanner, 8" CIM: SECS, GEM Handler: Type 3 Factory interface: Open cassette CYMER Laser: Distortion: 0.015 µm IU Flare: 1.80% Lens flare: 9.0% Uniformity: 5.3% Total focus deviation: 0.202 µm Astigmatism: 0.081 µm Coma: 0.062 µm ISO DOF: >35nm µm of CD Range Power supply: 779 mW 2000 vintage.
NIKON NSR S204B is a wafer stepper designed to create next-generation high-precision parts from crystals and other materials. NIKON NSR-S204B features NIKON Advanced Split Field Stereo Lithography (ASFS) technology, which enhances the speed and accuracy of photolithographic exposure. NSR S 204 B includes an improved beam source, optical path, projection optics, and new motor drive. This combination ensures a highly stable exposure environment with excellent overlay accuracy and extremely low non-uniformity. NSR S204B is designed to work with sliced crystals that are as thin as 0.04 mm (1.6 mils). The device has an OptiLand spot size as small as 58 µm and repeatability as small as 3 µm. NIKON ASFS technology separates the patterned visual fields, which provide a superior exposure uniformity across the whole exposure field. The exposure field is uniform in shape, which increases mechanical stability and eliminates distortion due to unequal focal lengths. NSR-S 204 B has an improved exposure speed and repeatability. The machine also has an advanced remote equipment monitor and an easy-to-use graphical user interface (GUI). NIKON NSR S 204 B includes tools for patterning, stepper setup, and measurement. Along with NSR-S204B, customers receive a comprehensive suite of software tools. These tools allow for efficient exposure in both high-end and low-end applications. NIKON NSR-S 204 B features an advanced aerial image evaluation system that enables accurate closed-loop alignment. The advanced image gradation and resolution adjustment techniques ensure superior image quality. NIKON NSR S204B also has an integrated Laser Goniometer/Reticule that allows for high speed, dual-axis alignment and alignment of non-linear patterned structures. NIKON NSR-S204B is equipped with an advanced process control unit. This machine allows for easy operator adjustment of the exposure settings and stepper parameters. The tool also includes a real-time data display and collection asset for monitoring, saving, and analyzing stepper operating results. NSR S 204 B has a compact size and is designed to fit into existing manufacturing environments. The machine is UL and CE certified, and it is designed to meet the stringent requirements of the semiconductor industry. The machine is also designed to handle multiple supplies of chemicals and photoresists, eliminating additional steps between processes. All of these features make this machine ideal for mass production applications.
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