Used NIKON NSR S204B #293799832 for sale
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ID: 293799832
Wafer Size: 6"
Vintage: 2000
Stepper, 6"
Wafer type: Flat
SiC Pin chuck
Resolution: ~ 0.2 µm
Exposure field: 26 x 33 mm
Reticle, 6"
Pre-alignment: NC Pre2
CYMER ELS 6400 Laser
Reticle alignment
Wafer alignment
Auto focus
Auto feeder
Wafer tilt
Wafer holder
BMU
PPD
Power supply: 200 V, 3 Phase
2000 vintage.
A NIKON NSR S204 is a wafer stepper, a type of lithography equipment used in the semiconductor manufacturing process. NSR S204 is an advanced stepper equipped with the latest advancements in wafer processor technology. NIKON S204 has a large field size of 150mm with a 25X reduction ratio, allowing for the exact reproduction of products when etching on a wafer. NIKON S204's advanced optics enables highly precise imaging to enable efficient production of quality substrates. NIKON S204 is equipped with a 5-axis motion control system for accurate alignment of wafers. This allows for accurate alignment of patterns to the wafer's surface and enables accuracy of +/- 2nm in alignment. Additionally, NIKON S204's z-axis alignment unit enables a repeatability of up to +/-3 nanometers of surface patterns, allowing for exceptionally precise patterning. Further, NIKON S204 utilizes an auto-focus machine to guarantee even illumination of the substrate, resulting in high accuracy and repeatability in patterned processes. Since the objective lens of NIKON S204 can be moved automatically depending on the substrate curvature, the machine can quickly adapt to varying substrates, enabling quick production of wafers. NIKON S204 also contains a number of high-end features to make microfabrication processes more efficient and accurate. Its advanced dynamic focus stabilization reduces the variability of the focus due to wafer temperature changes. Additionally, its Edge Blur Control feature enables production of uniform patterns with minimized edge blur. NIKON S204 also has its own proprietary NIKON Exposure Control Tool (NEX) to accurately measure the range key parameters like focus, film thickness and exposure. NEX adjusts the exposure level of each shot based on the measured film thickness of the previous shot, resulting in consistent results. Overall, NIKON S204 wafer stepper is a powerful, advanced stepper that enables production of highly accurate wafers in an efficient and precise manner. Its wide range of advanced features guarantees highly effective microfabrication processes.
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