Used NIKON NSR S204B #9195176 for sale

Name: NIKON NSR S204B
Brand: NIKON
SKU: 9195176
Availability: SoldOut

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Wafer Steppers

Manufacturer

NIKON

Model

NSR S204B

ID: 9195176

Wafer Size: 8"

Vintage: 2001

DUV Scanner, 8" Handedness: Inline left or right Altitude: Varies by site Lens type: 4eN2 Chamber type: Standard Chamber temperature set point: 22.2°C Variable numerical aperture: 0.55-0.68 sPURE Resolution enhancement technology (RET) RET Apertures iNA= 0.51, 0.45, 0.41, 0.36, 0.27, and 1/3 annular SHRINC Illuminator max σ; σ=0.85 Quick reticle change (QRC) Reticle, 6" Reticle loader With reticle controller Reticle barcode reader Field image alignment system (FIA) Laser step alignment system (LSA) Phase contrast FIA TTLFC2 Pre-alignment 2 Wafer stage: Air bearing / Linear motors Type 3 ceramic wafer holder Wafer loader With type 3 wafer loader controller Chip leveling included Multipoint focus/level Extended wafer carrier table Pellicle particle detector (PPD3) Online OCS NIKON SECS II GEM Interface CYMER ELS 6400 Series KrF excimer laser source 2001 vintage.

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NIKON NSR S204B is a highly advanced and versatile photolithography stepper used to produce high resolution integrated circuit chips. This stepper is capable of imaging wafers up to 8 inches in diameter. It uses a highly precise metrology system with a full-field scan to achieve supramicron alignment accuracy. The machine uses double-side alignment systems that measure the thickness and alignment accuracy of even extremely thin wafers. It has a unique dual-axis wafer stage which allows it to scan and image both sides of the wafer, ensuring that exposed patterns are accurate and without distortion. It also features a high-performance optical field flattener which ensures reproducible image quality. The wafers are processed with a variety of patterning techniques including photoresist coating and exposure. The illumination system of the stepper is a high-efficiency xenon lamp, with an exposure range from 1 second to 1 minute. The stepper can maintain an optical resolution of a staggering 0.1 micrometers, which is crucial for achieving highly accurate and finely detailed images in IC chips. The automatic focus detection and acquisition system of the machine allows for extremely accurate focusing of the wafer. The machine also offers a variety of programming and wafer handling options, such as wafer size detection, wafers and reticles exchange, as well as safety checks to ensure safe and successful operations. The design also includes a comprehensive suite of software and user features, allowing users to have total control of the machine, as well as access to sophisticated and dynamic data and functions. NIKON NSR-S204B also offers a range of other benefits, such as low power consumption, very short setup times, as well as a generous lifetime warranty on parts. NIKON NSR S2004B has been designed for optimal use for semiconductor fabrication, offering users a comprehensive, varied, and reliable wafer stepper. Its impressive technological capabilities and functions, combined with its user-friendly design and easy maintenance make the NSR S2004B an excellent choice for a wide range of chip fabrication and programming applications.