Used NIKON NSR S204B #9195220 for sale
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ID: 9195220
Wafer Size: 8"
Vintage: 2000
DUV Scanner, 8"
Wafer type: SNNF
Inline feed direction: Left
Sendai S36 Chamber
Lens type: 4EN2GK
Chamber temperature: 23°C
Reticle size: 6" x 6"
Field size: 25 x 33 mm
NIKON Standard reticle case
(24) Reticle slots
(2) Reticle libraries
Wafer loader: Type 3
Notch 6C, 8"
Low contact pin chuck
KOMATSU / GIGAPHOTON G20K2-1 Laser
Setup for 20 m altitude
Focus check function:
TTL-FC2
LSA, FIA Alignment chip leveling
Multipoint focus / Leveling (45 Point)
RET Shilink illuminator: 1/2, Annual, conventional, small sigma
Bottom pellicle mount
Reticle particle checker
Reticle bar code reader
Wafer carrier stage
SECS Protocol
2000 vintage.
NIKON NSR S204B Wafer Stepper is NIKON most advanced model of stepper technology. It is a highly automated, advanced device used in the fabrication of silicon wafers. NIKON NSR-S204B features a direct-drive equipment based on a variety of advanced designs, allowing for precise and repeatable positioning of the wafer. This precise positioning can be achieved across multiple wafers in order to create a larger and more complex structure or device. The highly precise and repeatable movements of the stepper allow for precise alignment and efficient production of the images or patterns on the surface of the silicon wafer. NSR S 204 B utilizes a number of innovative technologies to reduce aberrations and prevent mirroring — ensuring a high level of accuracy across wafers. Its motorized focus stem and flexible digital image-stabilization system help to eliminate the need for operator intervention. The stepper also incorporates NIKON patented multi-step deintegration unit, which allows patterns to be created on multiple layers of surface simultaneously. NSR-S204B is designed to operate at temperatures between -30℃ and +60℃, allowing it to reliably produce images over a wide range of environmental conditions. Its sophisticated laser-based algorithms enable precise submicron accuracy, even with wafer-to-alignment-arm spacing as small as 0.2mm. Additionally, the advanced imaging machine ensures consistent and repeatable performance under all environmental conditions. NIKON NSR S 204 B is both software and hardware compatible, meaning it can be integrated with NIKON other systems and software. This advanced functionality means that users can control the stepper from within the LSIA software. It also offers optional board hardware, making it compatible with both IBM and Mac computer systems. NSR S204B is also equipped with a built-in safety feature to prevent misalignment of the wafer. Additionally, the stepper's advanced design allows for easy maintenance and replacement of key components. In summary, NSR-S 204 B Wafer Stepper is an advanced device that offers users highly precise and repeatable positioning of the wafer. It features an array of innovative technologies that ensure a high level of accuracy across multiple layers of a silicon wafer. This device is extremely versatile and is compatible with both IBM and Mac computer systems. Furthermore, NIKON NSR-S 204 B has a number of safety features, making it incredibly easy for its users to maintain it and replace its key components.
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