Used NIKON NSR S204B #9243041 for sale

NIKON NSR S204B is a cutting-edge wafer stepper designed for advanced semiconductor fabrication applications. Utilizing NIKON proprietary VaritecTM equipment, NIKON NSR-S204B is capable of operating in both multi-patterning mode and single-exposure mode. Its advanced optics system, capable of delivering high resolution at low NA (numerical aperture) enables the stepper to produce a high resolution pattern at high throughput rate. Additionally, the wafer stepper is designed for quick and easy alignment, with both manual and auto-focus functions. NSR S 204 B has been designed with a comprehensive range of features, making it an optimal choice for advanced lithography applications. For example, its oxidation management systems have been developed to support low defectivity processes in the production of advanced semiconductor devices. The wafer stepper also includes NIKON proprietary "Smart Recipe Generator", which utilises an intuitive drag-and-drop interface to rapidly generate optimised recipes. An ultra-high vacuum (UHV) chamber unit is also included in the wafer stepper, which prevents defects due to oxidation and contamination. NSR S204B also includes a range of active and passive motion control systems, allowing for greater accuracy and throughput. Its dual-axis stage control is capable of providing high precision patterns, with scanning accuracy as low as 10 nm when using a 10 μm step size. The wafer stepper also incorporates a high-speed zoom module, allowing for pattern reimaging without manual resetting. Furthermore, NIKON NSR-S 204 B can achieve high precision pattern alignment, with the use of both a high-precision projection optics machine and alignment marks. Its overlay accuracy, when using NIKON proprietary ICF (Image Circle Fit) maximises performance across multiple substrates, leading to higher yield and device reliability. Overall, NSR-S 204 B is an advanced wafer stepper, specifically designed for high-precision patterning applications, such as advanced semiconductor device production. This makes it an ideal choice for advanced lithographic approaches, such as multi-patterning, low voltage lithography and ultra-low critical dimension semiconductor processes. High resolution and high throughput are combined with excellent process control and manageability, making NIKON NSR S 204 B an ideal choice for advanced semiconductor device production.