Used NIKON NSR S204B #9243843 for sale

NIKON NSR S204B is a wafer stepper used to precisely and accurately transfer patterns onto semiconductor wafers. It is able to achieve resolutions of 0.7 microns and provides a wide field of view of up to 22mm. This allows the machine to produce large scale patterns while maintaining high accuracy. The machine is also speedy, able to inspect up to 1000 wafer fields/min with high precision. The axis control equipment is designed to improve accuracy and stability, ensuring that each process is completed with precision and repeatability. The microscope itself is designed with a high resolution, digital image storage system that enables the operator to accurately measure and investigate the smallest details captured by the microscope. NIKON NSR-S204B is also equipped with exposure tools to control exposure time, dose, and focus. The tools allow the operator to obtain fine, high resolution images of the wafer while preventing exposure-induced damage. Furthermore, Anti-reflective-coatings can be applied to optimize imaging quality. The stepper utilizes an advanced, high-speed laser scanner unit, enabling powered operation and exposure. This ensures accurate and precise imaging, reduced overlay errors and an improved focus depth. The machine also boasts an advanced wafer alignment machine. It automatically determines focus shift and displacement, which ensures accurate exposure and alignment for higher yields. The alignment tool also reduces wafer exposure time, leading to faster throughput. NSR S 204 B has a user-friendly, intuitive operating interface that allows operators to easily access and control numerous functions of the machine. As an example, one can specify the desired exposure, exposure area, and exposure speed from the main screen. In addition, it comes with built-in, data capture and analysis tools. These tools allow real-time analysis of photo exposure and defect detection data to ensure consistent, high-quality imaging. NIKON NSR-S 204 B's is a high-precision wafer stepper capable of imaging large fields while still achieving the high resolution and low overlay levels in high volumes. Its precise, reliable autofocus, high-speed laser imaging, precise exposure control and easy data analysis tools open new possibilities for micro device production and make it one of the most advanced tools available in the semiconductor industry.