Used NIKON NSR S204B #9243873 for sale

NIKON NSR S204B is a semiconductor-manufacturing tool used to fabricate integrated circuits. It is a state-of-the-art wafer stepper, utilizing a unique hydrogen halide olefin projection coherent imaging (HHEOPCI) technology that is capable of producing mask patterns with 25nm line/space resolution. The HHEOPCI is specifically designed for the lithography processes required for high density and advanced packaging applications. NIKON NSR-S204B is equipped with advanced computational alignment and inspection systems that provide high resolution imaging and processing capabilities at the single pixel level. The machine coordinates and controls all of the components of the lithography process from the optical equipment to the stage motion, creating a highly integrated process with outstanding performance. The machine has a large depth of focus, low optical distortions, and multiple aberration correcting mechanisms, allowing for reproducible high resolution imaging. NSR S 204 B includes a large illuminated area, which allows for efficient wafer loading and unloading speed, thus increasing throughput. It also features a motorized movable objective lens that maintains high precision within the stepper. This helps in maintaining the exact feature size of the patterns generated. It also includes a low-noise and highly stable stage system, which ensures a smooth and accurate wafer positioning, delivering higher throughput and data accuracy. NSR-S 204 B offers a variety of features, including dual track integrated alignment (DTA) capabilities, which enable simultaneous alignment of two pattern-forming structures (e.g. source masks) and pattern matching capability, allowing for accurate alignment during repetitive operations. The enhanced thermal stability of the unit offers improved accuracy and repeatability of the imaging process. NIKON NSR-S 204 B is a reliable and advanced lithography stepper for generating high resolution, high strength and high-yielding 32nm chips. It provides accurate and consistent imaging for manufacturing reliably formed and packaged semiconductor products. The machine utilizes advanced motion control and ultra-high-resolution imaging systems to create highly consistent patterns and is compatible with the latest generation of photolithography resist materials.