Used NIKON NSR S204B #9244030 for sale

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Manufacturer
NIKON
Model
NSR S204B
ID: 9244030
Wafer Size: 8"
Vintage: 2001
KrF Scanner, 8" Wavelength: 180 nm Reticle size, 6" Wafer type: Notch Basic version: MCSV & BASE Option version: OCSV Includes: LFU Signal tower Stage Alignment Reticle loader Wafer loader Main lens Main computer: DMCC HDD FDD DAT Driver Unit status: BMU Laser type: GIGAPHOTON G20K2-1 Wafer stage: Air stage Variable reticle microscope Wafer alignment: LSA, FIA Auto focus and leveling: Multi PPD Barcode leader Reticle loader: Type: Normal / 3LIB Reticle size, 6" Wafer loader: Type 3 Notch type, 8" Notch zone: 6 Time In-line (Left) Single cassette Chamber status: Chamber type: ASAHI N5Z-A Atmospheric pressure: 755.7 mmHg Chamber temperature: Catc: 23°C Batc: 23°C Lltc: 23°C LFU & Signal tower missing 2001 vintage.
NIKON NSR S204B is an advanced wafer stepper designed for superior performance in pattern transfer production. Its powerful light source and advanced optics make it an ideal tool for the fabrication of high-resolution photomasks with nanometer-scale features. NIKON NSR-S204B is equipped with state-of-the-art scanner optics and a superlative illuminating system. The light source on NSR S 204 B is a UV discharge lamp with a maximum power output of 2.2 kW. This allows the stepper to achieve high throughput and low distortion levels, while still remaining capable of achieving excellent line widths and separations. The optics on NIKON NSR-S 204 B have been specially designed to allow for precise alignment and focus, even when imaging patterns with small feature sizes. NIKON NSR S 204 B is equipped with a high-speed piezoelectric motion platform, which enables it to accurately position wafers in the optimal exposure area for the best pattern transfer results. NIKON S204B also features a fully automated mask transfer system, which is capable of handling mask sizes up to 8 inches, as well as more advanced programs for more complex processes. It includes options such as auto-focus and auto-positioning, which allows the operator to quickly and accurately locate the perfect exposure area before shooting. NIKON S204B also features a built-in, non-contact defect detection system, allowing the operator to quickly identify and resolve any problems before further production steps. If you're looking for a wafer stepper that offers high precision and reliability in pattern transfer production, NSR-S 204 B is an excellent choice. It combines powerful, long-lasting UV light sources with advanced optics and a high-speed, piezoelectric motion platform, making it a great tool for nanometer-scale resolution photo-mask production.
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