Used NIKON NSR S205 #293660358 for sale

Manufacturer
NIKON
Model
NSR S205
ID: 293660358
KrF Scanner AIS Measurement repeatability: 3σ ≤ 60 nm Stepping precision: 3σ ≤ 25 nm Backlash: 3σ ≤ 25 nm Resolution: Conventional: 180 nm Annular: 2/3 Depth of focus: ≥ 400 nm / ΔCD 36 nm Focus deviation: ≤ 130 nm Dynamic distortion: ±15 nm LC Control Accuracy: Magnification: ±10 nm Alignment accuracy: FIA-EGA: |M|+3σ ≤ 35nm LSA-EGA: |M|+3σ ≤ 40nm.
NIKON NSR S205 is a high-performance, high-speed wafer stepper designed for semiconductor mass-production. It features a high-end scanning equipment, offering excellent image quality, precise pattern placement and small critical dimension (CD) errors for fine line processing. With its large depth-of-field, high numerical aperture (NA) of 0.75, generous scanning field size and a field depth that can accommodate 300 mm prime wafers with no need for scanning, NSR S205 ensures outstanding wafer-to-wafer overlay and excellent placement accuracy. To guarantee maximum uptime and minimized maintenance, NIKON NSR S205 is equipped with advanced hardware and software components. A CAN bus network communication system and an integrated vision unit provide quick, detailed feedback to the user. Its ergonomic, easy-to-handle wafer handling machine, complete with front-access, helps prevent misplacement and ensure fast switching. The wafer handling and shutter tool also features an integrated heater to keep the wafer temperature constant. For advanced processing, NSR S205 features an integrated laser direct imaging (LDI) asset. This model provides stable, secure exposure coefficients and uses laser interference fringe projection technology to accurately align patterns onto wafers. Additionally, digital stitching allows for the projection of highly complex patterns. NIKON NSR S205 is also equipped with an integrated beam alignment equipment, providing stable optical and electrical values and easy adjustment. NSR S205 represents the latest advances in wafer stepper technology. Its streamlined design allows users to reduce exposure to particles and contamination, while its high performance is ideal for mass production. Additionally, its compact size and reasonable price make it a valuable tool for a wide variety of industrial and academic applications.
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