Used NIKON NSR S205C #9258895 for sale

NIKON NSR S205C is a state-of-the-art lithography equipment that is capable of producing high-quality images on wafers. It is comprised of a Terasaki-type glass chamber, an i-line system, and a wafer stepper that uses a NIKON-developed DUV projection optics. The Terasaki-type chamber is designed to reduce vibration and provide a highly stable environment for the photomask aligner/stepper to operate in. The i-line unit consists of four i-line mirrors and a single i-line illumination source. The i-line machine provides extended depth-of-focus and improved printing performance resulting from less pixel distortion. NIKON-developed DUV projection optics provides double-sided patterning with high image contrast and low flare. The wafer stepper is a state-of-the-art wafer changing tool that is capable of automatically aligning and printing on wafers up to 8 inches in diameter. The i-line asset allows for high speed pattern shifting of up to 2cc/second. The model also features a high-precision stage, which provides the necessary stability to ensure that the mask patterns are printed with accuracy and reliability. NIKON-developed DUV projection optics are also designed to provide higher stepper throughput, enabling increased production yields. In addition to its advanced wafer-stepping capabilities, NIKON NSR S 205 C also features an advanced controller that provides a wealth of features including automatic mask alignment and edge tracking, high magnification monitor for seaming, automatic split aperture correction, and high accuracy accumulation. The advanced controller includes an embedded PC equipment, which communicates with the wafer stepper and the other controllers. Furthermore, the wafer stepper boasts of a user-friendly interface that simplifies operation and enables engineers to set up and control complex wafer patterns quickly and accurately. All in all, NSR S205C is a highly advanced wafer stepper capable of producing high quality images on wafers. With its Terasaki-type glass chamber, i-line system, NIKON-developed DUV projection optics and advanced controller, NSR S 205 C is an ideal choice for patterning wafers for semiconductor and flat panel manufacturing processes.