Used NIKON NSR S205C #9260061 for sale

Name: NIKON NSR S205C
Brand: NIKON
SKU: 9260061
Availability: InStock

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Wafer Steppers

Manufacturer

NIKON

Model

NSR S205C

ID: 9260061

KrF Scanner, 8" Main lens: Lens type: 4EN3 Magnification: 1/4 Light-source: KRF-Line, 248 nm Resolution: Conv (150 nm) RET (130 nm) Lens: 0.60 ~ 0.75 Exposure filed size: 25 x 33 mm Control and lens adjust system: Inner-MAC System hardware: Computer: DS Type Reticle size: 6" Variable reticle microscope Alignment sensor: Laser Step Alignment (LSA) Field Image Alignment (FIA) No Laser Interferometric Alignment (LIA) Aeial Image Sensor (AIS) ALG-AF Alignment Illumination system: CORE + RET Interferometer system: Wafer stage Reticle stage Focus system: Multi focus (7x7 Point) Leveling system: Multi leveling(7x7 Point) Wafer loader: Type 4 Notch type Wafer size: 8" Wafer cassette: Single cassette Wafer in-line: Left in-line Wafer Pre-Align2 type: Non contact Interface type: ACT 8 Reticle loader: 2-Library / 24-Slot Control rack: Right type No signal tower GIGA G21K2-1 Eximer laser Maximum frequency: 2 KHz BMU Active Temperature Control (ATC) (2) AMP Units: Single NEMA type Chamber: SENDAI S37 ASHAHI N6A-A Temperature (BATC / CATC / LLTC2): 23.0°C Options: No FFU unit LFU Unit Booster regulator: 0.1~1.0 Mpa Overlay data (FIA): X: -3 nm Average Y: 17 nm Average X (3σ): 16 nm Y (3σ): 15 nm Lens inclination data: TFD: 144 nm AST: 33 nm Lens distortion data: X: -12 nm~11 nm Y: -4 nm~8 nm Illumination ID (L-NA / I-NA): Power / Uniformity ID 1 (0.68 / 0.51): 1398 mW / 0.56% ID 3 (0.68 / 0.58): 1485 mW / 1.14% ID 6 (0.60 / 0.45): 1340 mW / 1.276% 2002 vintage.

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NIKON NSR S205C is a wafer stepper designed to handle the complex patterns written on semiconductors with optical lithography. Utilizing advanced technologies, NIKON NSR S 205 C is capable of printing a high resolution image with a resolution of 1.0 micron or less across a wide range of applications. NSR S205C is built on a two-level platform, the upper stage of which is an innovation from NIKON called Dynamic XYZ, providing an enhanced accuracy of 0.6nm for positioning the wafers, which is a true benefit for high resolution lithography. The equipment is highly accurate across many surfaces, with an impressive repeatability of 1.6nm. The lower stage consists of a highly precise high-ace motor, providing speed and accuracy across all motions and movements required to write patterns accurately. NSR S 205 C is equipped with the latest 8-inch full-field optics to substantially reduce measurement time and operating costs. This feature allows the system to lay down true 8 million pixels with exposure accuracy of 1nm. In addition, the unit has a 0.5nm convergent imaging capability, enabling it to produce the highest resolution images possible. NIKON NSR S205C is housed in an extremely durable and reliable aluminum alloy cabinet, with an in-built noise and heat control machine. The entire tool is operated through a powerful, user-friendly control software that facilitates pattern data and exposure control. NIKON NSR S 205 C also comes integrated with an automation asset to increase productivity and generate higher yields. NSR S205C is designed to offermanufacturers of semiconductors with a comprehensive solution that yields high production throughput and maximum precision. With its superb image formation capability, NSR S 205 C is the natural choice for companies looking for the highest performance in stepper fabrication.