Used NIKON NSR S205C #9308056 for sale

Name: NIKON NSR S205C
Brand: NIKON
SKU: 9308056
Availability: InStock

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Wafer Steppers

Manufacturer

NIKON

Model

NSR S205C

ID: 9308056

Wafer Size: 12"

KrF Scanner, 12" Magnification: 4x Wave length: 248 nm Exposure type: Static Handedness: Inline left / Right Track interfaces: TEL / TOKYO ELECTRON ACT 8, ACT 12-200, ACT 12 Lens type: 4:1 MAC Real-time lens control Chamber type: Standard Chamber temperature set point: 22.2°C Variable numerical aperture: 0.6 - 0.75 sPURE Resolution Enhancement Technology (RET) RET Apertures: 1/3 Annular (LNA: 0.75) 1/2 (LNA: 0.75) 2/3 (LNA: 0.75) 2/5 (LNA: 0.75) 2/5 (LNA: 0.68) SHRINC Illuminator σ: 0.85 Quick Reticle Change (QRC) (6) Reticles, 0.25" Reticle microscope compatibility: 22.0 mm fixed Reticle loader with reticle controller Reticle barcode reader Field Image Alignment (FIA) System Laser Step Alignment (LSA) System Phase contrast FIA TTLFC2 Beam matching unit Pre-alignment 2 Wafer stage: Air bearing / Linear motors Wafer loader: Type 4 AVIS System Multipoint focus / Level Extended wafer carrier table Pellicle Particle Detector (PPD3) NIKON SECS II GEM Interface CYMER ELS6410 KrF Excimer laser source.

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NIKON NSR S205C is a wafer stepper specifically designed for photomask lithography processes. This stepper features a proprietary static and kinetic imaging equipment that is capable of producing masks for a wide range of device applications from semiconductors to flat panel displays. NIKON NSR S 205 C stepper employs a high-throughput exposure head with a maximum resolution of 6.6 μm for superior image quality. It also incorporates the latest NIKON technologies, such as high-dynamic indexing (HDI) and direct laser writer (DLW), which enable sub-resolution imaging. Furthermore, this stepper is equipped with a seven-axis multi-stage automated wafer handling system that enables precise wafer alignment and placement. The stepper also includes an original Carl Zeiss-Varilux optical unit as well as NIPR (Nanometer Resolved Imaging Platform with Resolutions) to provide excellent resolution and repeatability for a wide variety of substrates and photomask types. In addition, NSR S205C features a fast arc-shaped-aperture imaging machine with a reduction in energy consumption. This stepper also offers proprietary atmospheric projection technology, which ensures minimal gas consumption throughout the exposure process. Moreover, the stepper is capable of simultaneous single or double exposures in a single exposure operation, thus allowing operators to make one exposure on one or two masks. The whole NSR S 205 C tool features a user-friendly graphical interface with a high-performance operability that is programmed with a variety of lithography simulations and parameters. Moreover, this stepper is also equipped with an energy-saving auto-sensing wafer feeding asset, which enables energy savings as well as safe operation. Additionally, an auto-autofocus model automates the focus setting process and produces excellent wafer centering accuracy. Furthermore, the stepper comes with a customizable interface, allowing users to optimize the lithography parameters for a variety of applications. Overall, NIKON NSR S205C is an advanced wafer stepper designed for optimized lithography processes. It is ideally suited for the production of semiconductors, flat panel displays, image sensors, and other image-related products. It is equipped with a powerful imaging equipment and a variety of advanced features, making it an appropriate choice for a variety of applications.