Used NIKON NSR S207D #293587213 for sale

NIKON NSR S207D is a state-of-the-art high-precision wafer stepper designed to meet the demanding requirements of ultra-small feature patterning in today's advanced semiconductor fabrication. With a maximum resolution of 0.3 microns, a minimum step time of 1 ms and an all-in-one exposure field size, the S207D is the perfect tool for fine pitch and high-density device applications. Powered by an innovative dual-stage source lens system, the S207D delivers exceptional exposure uniformity and high throughput performance for a range of wafer sizes. The motorized exposure distance and objective lens shift ensure a constant aerial image intensity, while the ultra-short wavelength, short-pulse SCRF exposure system helps to attain the highest single exposure throughput available in the industry. The S207D is equipped with a wide range of exposure technologies to accommodate all kinds of lithography requirements. These include MAPSYN, LEAP, SEM-LIG and Flip exposure technology, as well as dedicated wafer and mask aligners to ensure maximum accuracy and quick processes. The S207D also supports a number of exposure profiles to ensure each process is optimized for specific device types, making it perfect for a wide range of processes. In addition to its impressive exposure performance, the S207D also features a number of features designed to streamline its operation. These include a fully modular and serviceable design, allowing it to be quickly installed and serviced in a range of locations. The S207D also features an advanced automation package, allowing for fully automated wafer processing including wafer mount/dismount, exposure and wafer processing. NIKON NSR-S207D is the ideal solution for any advanced semiconductor fabrication processing. With its excellent performance, complete automation package and exceptional throughput, it is the perfect tool to ensure the efficient and cost-effective production of ultra-small feature patterns.