Used NIKON NSR S208D #293629357 for sale
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ID: 293629357
Wafer Size: 12"
Vintage: 2010
KrF Scanner, 12"
FOUP System
SMIF
Amp rack
Temperature controller
CYMER Laser
Air conditioner
2010 vintage.
NIKON NSR S208D is a dedicated wafer stepper with a number of advanced features that make it a great choice for microlithography applications. It has a fully automated reticle alignment equipment with 0.5 nm accuracy, a maximum 6-inch exposed size, and a minimum 0.2 µm feature size. Additionally, its maximum alignment accuracy of 1.5 nm allows for the directing of ion beams to areas as small as a single grain boundary. The system is able to scan a range of exposure field sizes, from 8 × 6 inches to 16 × 12 inches. It also features a variable speed linear drive unit that allows for a maximum of 1 Hz to 10 Hz wafer stepping speed without increasing projections and a maximum of 1 kHz exposure frequency. The exposure time per step is typically 1 second or less. The exposure time can also be adjusted in order to meet each user's specific exposure requirement. NSR S208D also has a range of exposure wavelengths, 8 choices in total, with a maximum wavelength of 248 nm. Additionally, this wafer stepper has a full automation machine for built-in film and maculature process control that is designed to optimize exposure results with minimal exposure time. This capability enables accurate, repeatable results with less waste. Moreover, the ion beam reduction tool present in this asset reduces the effects of scatter light significantly, thus increasing the yield. It also offers high versatility in terms of pattern exposure variations and device process requirements. This makes it suitable for various operations related to device wafer manufacturing and process control. Additionally, it is also lightweight, at only 112 kg, hence providing easy and accurate automation of step-type patterns. With the upgraded model chipman, NIKON NSR S208D wafer stepper offers continuous exposure without the need to stop and reposition the alignment. This makes it an efficient solution for a range of micro-lithography applications. Additionally, the equipment is fully controllable from NIKON image software, and it also has a robust microscopy system for imaging processing and analysis. All in all, NSR S208D wafer stepper is a reliable and versatile unit for microlithography and is suited for a range of high-volume device manufacturing operations. Its automated reticle alignment machine, high accuracy and range of exposures make it a great solution for your wafer stepper needs.
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