Used NIKON NSR S307B #9261672 for sale

NIKON NSR S307B Wafer Stepper is a high-performance lithography equipment that enables the patterning of micro and nano structures for the production of electronic and opto-electronic devices. The system comprises a laser interferometer-controlled stage, a CCD camera, a computerized lens unit, a multi-chamber vacuum machine, and a digital imaging processing tool. The asset is designed to accommodate various kinds of reticles from 5 x 5 to 8 x 8 inches (12.7 x 12.7 cm to 20.3 x 20.3 cm), and to provide high resolution imaging with low blur. The model is equipped with an advanced CCD camera that facilitates a two-dimensional scanning of the reticles, enabling exposure of the entire field, or chip-level alignment. NSR S307B features a highly accurate and repeatable laser interferometer-controlled stage, which provides excellent vibration-free movement and high-accuracy positioning of the substrate or reticle in three dimensions. The CCD camera is equipped with digital imaging processing systems that can encode the device shape of high-plexity reticles, and calculate substrate contours or alignment marks with high accuracy. This enables fast and accurate alignment between each field. The equipment is also equipped with a multi-chamber vacuum system, which enables the transfer of the substrate or reticle without the possibility of contamination. NIKON NSR S307B is designed to provide excellent long-term performance in the production environment. The unit is capable of processing large reticles with high throughput and low cycle times, and can accommodate a wide variety of substrates up to 8 inches in diameter. NSR S307B Wafer Stepper is designed to provide excellent cost and performance benchmarks in the production of micro- and opto-electronic devices. Its CCD camera, digital imaging processing systems, and highly accurate stage equipment enable improved throughput, accuracy, and cost-effectiveness at the chip- and wafer-level. Additionally, its vacuum machine provides a cleanroom-like environment for contaminant-free transfer of reticles or substrates. This tool is suited for a wide variety of production needs and is a reliable choice for high-performance wafer-level production.