Used NIKON NSR S307E #9386223 for sale

NIKON NSR S307E is a high-performance wafer stepper, designed for advanced lithography processes. It offers flexibility and scalability with advanced features and technologies to enhance lithography processes and performance. It provides ultra-precise resolutions, high throughput, and low cost of ownership. NSR S307E is ideal for production processes that require extremely fine patterning with small feature sizes and narrow tolerances. It can handle a wide range of substrates, ranging from wafers as small as 1.6 mm in diameter up to 300 mm. The stepper is capable of a field size of up to 200 mm by 200 mm, with a minimum pitches as fine as 0.075 µm and a minimum feature size of 0.2 µm. It has an available resolution of between 0.3 nm and 0.5 nm. NIKON NSR S307E also offers a range of advanced features and technologies. It features an on-tool optical calibration system, which ensures accurate imaging and alignment, and a wide choice of exposure sources, such as He-Cd, KrF, and I-line. The stepper also includes a fully automated focus and alignment sequence, and a laser interferometric alignment system. NSR S307E has also been designed for a variety of photomask types, from standard and double-sided masks, to high-reflection and patterned masks. It also offers advanced functions such as alignment selectivity, multiple patterning overlays, and optional quartz mask capability. Additionally, the stepper is also capable of multi-layer processes, with optical uniformity and defect inspection to ensure consistently high production yields. NIKON NSR S307E also provides a wide variety of options and accessories to further enhance its features and capabilities. It includes options for high-aspect-ratio etching, in-situ thickness measurement, and an extended depth of focus. It can also be used with various types of manipulators, such as rotary, motorized, and coordinated stages. Overall, NSR S307E is an advanced but easy-to-use wafer stepper that offers superior lithography performance required for advanced device applications. It offers high-performance imaging capabilities, flexible feature size and resolution, and precise alignment functions. With its range of features and accessories, it provides an ideal solution for any chip production process.