Used NIKON NSR S322F #293665226 for sale

Manufacturer
NIKON
Model
NSR S322F
ID: 293665226
Wafer Size: 12"
Scanner, 12" Wavelength: 193 nm Lens-NA: 0.92 Exposure field: 26 x 33 mm Reduction ratio: 1:4 Resolution: ≤ 65 nm Single machine overlay: ≤ 2 nm Mix and match overlay: ≤ 5 nm Throughput: 300 mm Lens data included.
NIKON NSR S322F is a revolutionary wafer stepper that offers a wide range of capabilities for semiconductor fabrication. This step and repetition alignment equipment is designed for high resolution wafer stepper applications and is the first stepper of its kind designed specifically for the requirements of automated wafer lithography. It utilizes NIKON "i" series optics, which offers excellent field flatness, surface roughness, and high resolution imaging capabilities. NSR S322F is capable of wafer sizes up to 200 mm diameter—the largest diameter currently available for wafer fabrication. It also features a 4 inch vision system with advanced features including full image capture and stitching, boost mode, and phase fill capability. In addition, the build-in automated defect Review (ADR) unit allows for the detection and correction of any defects or inconsistencies on the wafer before it is shipped. NIKON NSR S322F also has high geometric accuracy, with an alignment accuracy of 0.5 micrometers. This means that it is capable of producing large, accurately shaped components without any distortion or distortion related effects. Furthermore, this stepper offers a throughput of up to 900 wafers per hour with 8-inch or 12-inch mask, and offers an aperture size of up to 0.5 micron with an optical beam size of 0.4 Micron. Lastly, NSR S322F is designed with an energy-efficient optical source, allowing for higher stability and energy savings during operation. This stepper also offers excellent temperature control for optimal resolution, allowing users to adjust the focus of the machine with ease even under high temperature conditions. Additionally, it also includes a centralized control tool, which offers easy access to the intended stepper parameters. This ensures that the wafers are processed in the most efficient way, providing optimal performance and product quality.
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