Used NIKON NSR S609B #9223197 for sale

NIKON NSR S609B is a precision pattern recognition micro-stepper-type exposure equipment designed for advanced lithography applications. As an immersion imaging system with a near-field light source, NSR S609B incorporates a wide range of advanced features, making it suitable for advanced applications in the fields of integrated circuits, flat panel displays and other leading-edge technologies. NIKON NSR S609B offers an advanced spatial alignment unit that is capable of detecting global or local alignment errors quickly and precisely. The machine is optimized to accurately perform image registration, orienting itself according to the back-side or front-side gate alignment marks on the resist layer. The tool also uses a proprietary optical sensing technique for detecting multiple stepper alignment marks for a more precise pattern selectivity. NSR S609B features an extremely fast exposure speed, making it ideal for high-speed lithography applications. The asset is capable of delivering up to 4 exposures per second to satisfy the most demanding throughput requirements for integrated circuits and flat panel displays. The model also provides high depth of focus and ease of integration with other systems for advanced imaging solutions. The advanced imaging equipment is capable of precisely focusing and aligning layers over extended field depths and with minimal sample-to-sample focusing. NIKON NSR S609B is equipped with a 6-inch microscope port for easy integration with existing lab setups. NSR S609B is also capable of achieving unparalleled resolution and pattern feature size control. This makes it an ideal system for the demanding requirements of lithographic applications in the fields of integrated circuits and display substrates. The unit has the ability to produce down to 0.6 µm feature size, and can handle a minimum feature size of 25 nm and a minimum line pitch of 50 nm. NIKON NSR S609B is designed with high precision mechanical registration and advanced numerical control (NC) technology. This contributes to a highly precise and repeatable pattern placement and overlay accuracy. The machine renders stable and repeatable imaging performance of patterns regardless of the shape or size due to its low main-axis level and high resolution stepper motor pulse control. NSR S609B is designed for optimal usability and operator convenience. The tool is fully compatible with STEP-NC programming and remote control, allowing it to be integrated into a variety of manufacturing environments. Furthermore, the machine is equipped with a 24 V light source, allowing it to be used as an on-machine device, and comes with a digital user interface to simplify asset utilization and reduce machine interaction time. In summary, NIKON NSR S609B is an advanced wafer stepper model designed for high performance imaging and rapidly developing technology applications. Its combination of speed, accuracy and usability ensures that it is capable of addressing the most demanding lithography needs.