Used NIKON NSR S610C #293633334 for sale

NIKON NSR S610C is a wafer stepper designed for lithography applications that require accurate and precise exposure of features down to 100 nanometers or below. It is a 6-axis equipment that uses a high-magnification, multi-layer lenses, laser interferometer autofocus, and a unique Quad Air Bearing system to ensure highly accurate and repeatable production of high-quality semiconductor chips. NSR S610C uses high-power illumination and ultra-fast image-capturing capability to provide repeatable and accurate outputs over a wide range of exposure times. The unit also offers superior through-focus image scanning to maximize image accuracy and minimize stigmation errors. It is also equipped with a full complement of pattern-recognition and defect-detection functions. NIKON NSR S610C is capable of exposure speeds ranging from 1 to 90 picoseconds, which is the equivalent of 10,000 exposures per second. It is capable of exposing different types of resists from those with high-refractive-index surfaces to those with highly reflective interfaces. The machine also supports advanced metrology tools, such as advanced scatterometry, for high-precision pattern fidelity checking and process control. NSR S610C is equipped with a suite of process monitoring and control features, including real-time aerial image inspection, direct wafer review, blur measurements, and edge detection. The tool also features an intuitive graphical user interface that provides users with a familiar and easy-to-use platform for controlling their processes. NIKON NSR S610C offers advanced customization options, including various operational masks and presets, as well as optional real-time process analysis and monitoring. The asset can be configured with a variety of interchangeable optics, such as wide-angle lenses and fluidic-lens scanning systems, and a combination of special-purpose lenses. It also has integrated remote operation functions, such as remote focusing and exposure adjustment, and remote monitoring and adjustment of exposure parameters. NSR S610C is an ideal wafer stepper for lithography applications that require highly repeatable and accurate exposure of features down to 100 nanometers or smaller. Its reliable performance, advanced customization features, and intuitive graphical user interface make it a valuable asset for any lithography lab or production line.