Used NIKON NSR S610C #9207261 for sale

Manufacturer
NIKON
Model
NSR S610C
ID: 9207261
Vintage: 2007
ArF Immersion scanner Resolution: ≦ 45 nm NA: 1.30 ArF Excimer laser Reduction ratio: 1:4 Maximum exposure range: 26mm x 33mm Overlay accuracy: ≦ 6.5 nm Throughput: ≧ 130 Wafers / hour (300mm) 76 shots Main chamber Loader chamber SMIF Port FOUP Port Loader rack Front rack Rear rack Sub temperature controller Air conditioner Amplifier rack Power supply module AFB LFU 2007 vintage.
NIKON NSR S610C Stepper is a high-end wafer stepper that incorporates a truly integrated approach to photolithography. This stepper employs a fast two-stage imaging system that permits the use of shorter exposure times than conventional wafer steppers. NSR S610C Stepper utilizes a high-performance 4-inch projection lens to minimize distortion and reduce aberrations, ensuring a high quality output. This stepper also offers a unique dicing function which allows for use of a variety of customized processes. NIKON NSR S610C Stepper features a multi-field direct alignment sensor that provides specific information about the orientation and position of the wafer. This stepper also offers a wide range of exposure dose calculation mode options which allows users to easily adjust the output quality. NSR S610C Stepper utilizes an advanced mechatronic design which allows for quick and precise alignment, allowing users to reduce cycle time. NIKON NSR S610C Stepper boasts an integrated focus servo control module that provides excellent repeatability, guaranteeing accurately controlled depth of focus across the entire wafer. To ensure minimized particle introduction, NSR S610C Stepper features an advanced system for controlling ozone and particles. This stepper offers varied water temperatures ranging from 27°C - 45°C to ensure optimal conditions for wafer processing. NIKON NSR S610C Stepper also offers part-by-part (PBP) process control with a wide range of job parameters that can be stored for each batch of wafers. NSR S610C Stepper integrates the highly accurate SU-8 laser-coded resistivity and remote sensing to enable easier control over the masking process. This stepper utilizes an environmentally sustainable design featuring a fully shielded plasma exhaust system, easing usage of hazardous materials during wafer processing. NIKON NSR S610C Stepper provides modularization capabilities with its numerous application-specific and custom modules. This stepper enables users to process multiple substrates with a wide range of materials and sizes, allowing them to efficiently complete high-end wafer production requirements. NSR S610C Stepper is engineered for high accuracy, speed, and quality, making it a top-notch wafer stepper for photolithography applications.
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