Used NIKON NSR SF100 #132126 for sale

NIKON NSR SF100 is a wafer stepper designed specifically for fine-feature, sub-micron lithography. The stepper features advanced alignment and optimization capabilities to ensure the highest quality lithographic results. NIKON NSR-SF100's dual-actuator XY stage equipment allows for high accuracy and repeatability of pattern placement on the wafer. The stage also incorporates a die aligner optical system, equipped with 1 µm movement resolution and ±2 wem alignment accuracy. Additionally, the stepper features an automatic alignment feedback unit, which accurately detects and corrects edge-placement errors in real-time, ensuring top-quality lithography results. NIKON SF100 wafer stepper utilizes an advanced illumination machine, which supports a wide range of exposure conditions and provides high productivity with excellent Exposure--to-resolution (E:R) ratio. The stepper is also equipped with a high-speed non-contact wafer loading and unloading tool, allowing for rapid complete wafer load and unload cycles. NSR SF 100 offers a 400-mm maximum wafer size and a maximum of 36 exposure fields per wafer. It works with SEL Design Expert and SEL Framework software, offering a comprehensive set of tools for overlapping-region correction and process optimization support. Through improved TIS (total imaging asset) characteristics, NIKON NSR-SF 100 wafer stepper offers the highest lithographic results in advanced device manufacturing processes. NSR-SF100 wafer stepper has many other features that make it an ideal choice for submicron lithography processes. It incorporates a broad-range energy control model and accurate, low-noise energy scanning capabilities. In addition, the stepper features image-formats support, unlimited optical equipment parameters, and high operating speed, supporting the highest throughput without sacrificing accuracy. Overall, NIKON NSR SF 100 is an advanced lithography stepper, offering superior performance and exceptional lithography reliability for the most demanding research and manufacturing applications. The stepper's advanced features and high accuracy make it the ideal choice for companies looking to achieve superior results in submicron lithography processes.