Used NIKON NSR SF110 #293655797 for sale

NIKON NSR SF110
Manufacturer
NIKON
Model
NSR SF110
ID: 293655797
Stepper.
NIKON NSR SF110 is an advanced wafer stepper that is designed to provide optimal performance for today's microlithography applications. It has been designed to enable higher throughput with fewer defects. NSR SF110 is the flagship product from NIKON NSR range of steppers, and provides the latest advances in optical lithography technology. NIKON NSR SF110 offers a wide range of features and flexibility, making it suitable for a variety of microlithography processes. The stepper is equipped with a highly advanced high-performance main exposure illumination equipment, with an optimized numerical aperture (NA) of 0.78. It also features a high resolution interferometric contrast system for performance measuring, and a fault detection unit with automated fault correction capabilities. A key feature of NSR SF110 is its two-stage base which allows for tilting and rotation of the wafer stage, making it easier to align to the exposure lens. The stepper also supports fine stage movements, providing precise and accurate processing of the wafer. NIKON NSR SF110 is also equipped with efficient auto-balancing of more than 30 internal parameters, allowing optimal setting conditions for each wafer exposure. It additionally features an automatic toning scale machine for adjusting the exposure light intensity, enabling higher exposure accuracy with fewer defects. NSR SF110 is powered by a high-performance computer control unit, with a Liquid Crystal Display panel for easy operation. It has low thermal drift and a vibration reduction function to minimize vibration-induced optical errors. The stepper also features an exposure report generation tool, giving the user a comprehensive overview of their process. NIKON NSR SF110 wafer stepper combines a wide range of advanced features, allowing for efficient wafer exposure with minimal human intervention. Its advanced features, flexibility and superior performance make it a great choice for microlithography applications.
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