Used NIKON NSR SF120 #293628325 for sale

NIKON NSR SF120 wafer stepper is a high-precision lithography machine designed for photomask production. This wafer stepper uses multichip projection optics and a fully-automatic aligner, as well as a variety of other components, to offer photomask production with unprecedented accuracy and stability. NIKON NSR-SF120 achieves a high level of image quality within a compact footprint, making it highly suitable for back-end processes such as contact alignment, via alignment, and line/space patterning. NSR SF 120 utilizes an extremely precise single-column 4-field alignment equipment combined with an open-loopGalvo-mirror. This provides extremely accurate alignment and greater framing accuracy than other available photomask production systems, while also being more highly configurable and easier to operate. NSR SF120 also features a dry wafer stage, allowing it to dispense with the need for a wet-state production environment. The high-precision projection optics incorporated in NIKON NSR SF 120 provides an imaging and lithography accuracy of 2.0-3.0 microns. Along with the wider field-of-view the system offers, this makes NSR-SF120 ideal for production of advanced photomasks and semiconductor patterns with challenging shapes and geometries. The device also possesses amazing scan rate of up to 1m/s, making it suitable for high-volume production. NIKON NSR SF120 also boasts integrated autofocus unit, providing excellent depth-of-focus (DOF). This enables the machine to automatically adjust the focus setting during wafer scanning, assuring the highest achievable image quality in every case. Also, NIKON NSR-SF120 features a fast automatic batch align feature with the ability to place target patterns accurately and quickly onto the desired coordinates while eliminating rounding errors. NSR SF 120 features a fast robotic wafer exchange (REX) tool that automatically exchanges wafers and exfoliation plates, allowing for higher throughput and reduced labor costs. It also includes an advanced inspection and calibration asset that makes precise charting and repeatability of target patterns easier than ever. Furthermore, its advanced software includes precise three-dimensional software simulator that provides virtual lithography and contour alignment in a reliable and efficient manner. All in all, NSR SF120 is a highly precise, versatile, and reliable wafer stepper ideal for production of high-precision photomasks. With its state-of-the-art optics, automatic process flow and batch aligner, fast wafer exchange, and precise wafer stage and inspection systems, NIKON NSR SF 120 provides the highest level of image quality, throughput and stability currently available.