Used NIKON NSR SF120 #293757652 for sale

NIKON NSR SF120 Wafer Stepper is an advanced lithography solution designed to provide high-performance mask imaging requirements for semiconductor processes. The device features an all-around design that offers improved productivity with high exposure accuracy and repeatability. The device is controlled by a high-speed imaging software based on NIKON microprocessor technology. It is capable of supporting 2x exposure speed compared to its predecessor, allowing for faster implementation. NIKON NSR-SF120 utilizes two upper and lower cameras and an eight-inch Variable Magnification Projection Optics (VMPO) with a variable aperture. This ensures superior imaging results with high repeatability and superior depth of field (DOF). The stepper is equipped with a high-acceleration stage for faster wafer scan and patterning. Also, NSR SF 120 offers improved flexibility with modular upgrade capability, allowing for an easy upgrade in the future. NSR-SF120 is able to achieve simultaneous exposure and wafer scan with an enhanced beam delivery system. It combines high levels of overlay accuracy and low variation in image resolution. The device is also compatible with NIKON 5X oil immersion lens for high numerical-aperture (NA) imaging applications. In terms of throughput, the device is able to achieve high productivity through its loading and unloading capabilities. NSR SF120 has high precision and repeatability enabling the use of single-exposure patterns or even parallel exposures for high-detail imaging. The device is also capable of sub-wavelength resolution, 1 nm L/S exposure accuracy, and optical first-line compensated assist images. Further, the device has automated alignment and alignment mark identification capabilities, allowing for improved coat uniformity at reduced resist consumption. Overall, NIKON NSR SF 120 Wafer Stepper is an advanced imaging tool that offers excellent imaging results for semiconductor processes. It features high-precision, repeatability and speeds, with advanced imaging capabilities, modular upgrade capability, improved beam delivery system, and enhanced workflow capabilities. This device is able to produce precise images with sub-wavelength resolution and superior overlay accuracy for high-quality production.