Used NIKON NSR SF120 #293817934 for sale

NIKON NSR SF120 Wafer Stepper is a fully automated machine designed to deliver high accuracy patterning at top speeds with maximum productivity. This machine boasts a 6-inch or 8-inch wafer size, a maximum field size of 400mm x 400mm, and a high resolution of 0.059 μm in double-patterning overlay. It is well equipped for various patterning technologies and application, such as reactive ion etching, ion implantation, and dry etching. NIKON NSR-SF120 utilizes unique design features that maximize efficiency and accuracy. With a focus on versatility and speed, NSR SF 120 offers a multi-stage autofocus feature that provides a high level of accuracy to match the complexity of modern self-aligned multi-patterning (SAMP) process. This feature also improves throughput by reducing focus time and providing a wide range of repeatability not achievable with previous technologies. NSR-SF120 also features a pulse scanner with high acceleration and deceleration. This feature helps to increase throughput and reduce achievable resolution by allowing high-speed image scanning. With a scan cross section of up to 6.5nm, NIKON NSR SF 120 is well-prepared to accommodate the needs of even the most advanced foundry processes. The unique illumination optics of NSR SF120 make it ideal for processing wafers with non-uniform topologies. The Variable Edge Stray Light Illumination System (VESLI) enables optimized optical distributions to accommodate the ever-changing wafer topology, while providing improved photosensitivity and contrast. This can lead to quality improvements in patterning accuracy, while still providing a high productivity operation. To maximize the process efficiency of NIKON NSR SF120, a multiple light path option is available that allows for simultaneous, high-speed imaging of two or more wafers. This can reduce the time required for wafer exchange and image verification tasks, leading to increased process throughput. NIKON NSR-SF120 is a highly sophisticated, yet easy to use machine that has the required features and performance necessary for the most demanding processes. It is a reliable and powerful tool that can deliver optimal results for all manner of advanced patterning applications, including ion implantation and mask-level lithography.